Mr. Phil Stopford Profile

Phil Stopford

at Synopsys Inc

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Author

Publications (4)

Proceedings Article | 12 November 2024 Presentation + Paper

Metalens response to process variation

Andrew M. Dawes, Lawrence Melvin, Maryvonne Chalony, Betsy Grubbs, Phil Stopford, Jian Rao, Rajeev Ranjan, Joachim Siebert, JiSoo Park, Ying Zhou

Proceedings Volume 13216, 132161F (2024) https://doi.org/10.1117/12.3034641

KEYWORDS: Manufacturing, Etching, Design, Lithography, Optics manufacturing, Metalenses, Lens design, Phase shifts, Thin films, Infrared telescopes

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Proceedings Article | 1 May 2023 Presentation + Paper

Computational patterning and process variation impact on photonics devices

Maryvonne Chalony, Lawrence Melvin, Rainer Zimmermann, Bernd Küchler, Emilie Viasnoff, Robert Scarmozzino, Daniel Herrmann, Yves Saad, Phil Stopford, Thuc Dam, Ulrich Klostermann, Wolfgang Demmerle, Al Blais, Remco Stoffer

Proceedings Volume 12499, 124990A (2023) https://doi.org/10.1117/12.2658788

KEYWORDS: Design and modelling, Manufacturing, Polarization, Optics manufacturing, Photonic devices, Optical lithography, Incident light, Metalenses, Geometrical optics, Optical proximity correction

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Proceedings Article | 28 April 2023 Presentation + Paper

Electrical analysis of a stochastically simulated 2 nm node electrical test structure

Lawrence Melvin, Wolfgang Demmerle, Joachim Siebert, Phil Stopford, Sergey Zavadskiy, Renato Hentschke, Krishna Ramkumar, Sylvain Berthiaume, Yudhishthir Kandel, Wolfgang Hoppe, Ulrich Klostermann, Zachary Levinson, Hans-Jürgen Stock, Ulrich Welling

Proceedings Volume 12495, 124950W (2023) https://doi.org/10.1117/12.2658780

KEYWORDS: Stochastic processes, Resistance, Simulations, Overlay metrology, Optical lithography, Lithography, Optical proximity correction, Ruthenium, Etching

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Proceedings Article | 23 March 2020 Presentation + Paper

Simulation of photoresist defect transfer through subsequent patterning processes

Dominik Metzler, Mohamed Oulmane, Sagarika Mukesh, Phil Stopford, Karthik Yogendra, Lawrence Melvin

Proceedings Volume 11329, 113290H (2020) https://doi.org/10.1117/12.2551731

KEYWORDS: Defect inspection, Etching, Photoresist materials, Photomasks, Stochastic processes, Dielectrics, Data modeling, Process modeling, Lithography, Metals

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