Mr. Robert A. Wildfeuer Profile

Robert A. Wildfeuer

at Qimonda Dresden GmbH & Co OHG

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 24 March 2008 Paper

CD-SEM contour-based process monitoring in DRAM production environment

Uwe Kramer, David Jackisch, Robert Wildfeuer, Stefan Fuchs, Franck Jauzion-Graverolle, Gilad Ben-Nahumb, Ovadya Menadeva, Stefano Ventola

Proceedings Volume 6922, 69221C (2008) https://doi.org/10.1117/12.774114

KEYWORDS: Electrochemical etching, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Computer aided design, Metrology, Calibration, Finite element methods, Environmental monitoring

Read Abstract +

Proceedings Article | 28 March 2007 Paper

Modular process modeling for OPC

M. Keck, C. Bodendorf, T. Schmidtling, R. Schlief, R. Wildfeuer, S. Zumpe, M. Niehoff

Proceedings Volume 6520, 652044 (2007) https://doi.org/10.1117/12.716295

KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

Read Abstract +

Proceedings Article | 10 March 2006 Paper

Process influence study on optical model generation during model-based OPC development

ChinTeong Lim, Vlad Temchenko, Woong-Jae Chung, Dave Wallis, Robert Wildfeuer, Uta Mierau, Sebastian Schmidt, Martin Niehoff

Proceedings Volume 6155, 615503 (2006) https://doi.org/10.1117/12.655801

KEYWORDS: Data modeling, Calibration, Photoresist processing, Optical proximity correction, Process modeling, Optical calibration, Diffusion, Coherence (optics), Statistical modeling, Model-based design

Read Abstract +

Proceedings Article | 16 August 2002 Paper

Application of lithography simulation in reticle inspection

Christian Kalus, Robert Wildfeuer

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479362

KEYWORDS: Inspection, Reticles, Thin films, Cadmium, Lithography, Optical lithography, Optical simulations, 3D modeling, Performance modeling, Diffusion

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Accuracy of new analytical models for resist formation lithography

Juriy Malov, Christian Kalus, Henning Muellerke, Thomas Schmoeller, Robert Wildfeuer

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474506

KEYWORDS: 3D modeling, Photoresist processing, Absorption, 3D image processing, Lithography, Process modeling, Optical lithography, Algorithm development, Diffusion, Photoresist materials

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years