Romain Delhougne
R&D Scientist at imec
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 13 June 2022 Poster
Roy Koret, Harold Dekkers, Quentin Smets, Romain Delhougnea, Gouri Sankar Kar, Joey Hung, Vanessa Zhang, Wei Ti Lee, Amiad Conley
Proceedings Volume PC12053, PC1205313 (2022) https://doi.org/10.1117/12.2613750
KEYWORDS: Silicon, Annealing, X-ray fluorescence spectroscopy, Thin films, Refractive index, Doping, Control systems, Capacitors, Zinc, X-rays

Proceedings Article | 26 May 2022 Presentation + Paper
Gaetano Santoro, Kevin Houchens, Janusz Bogdanowicz, Moshe Elizov, Lior Yaron, Michael Chemama, Alex Goldenshtein, Amit Zakay, Noam Amit, Basoene Briggs, Antoine Pacco, Romain Delhougne, Andrew Cockburn, Yaniv Abramovitz, Aviram Tam, Ofer Adan, Hans Mertens, Anne-Laure Charley, Naoto Horiguchi, Philippe Leray, Gian Francesco Lorusso
Proceedings Volume 12053, 120530L (2022) https://doi.org/10.1117/12.2613771
KEYWORDS: Transmission electron microscopy, Metrology, Scanning electron microscopy, Metals, 3D metrology, Molybdenum, Tin, Semiconducting wafers, Signal to noise ratio, Process control

Proceedings Article | 28 March 2017 Presentation + Paper
Gian Francesco Lorusso, Takeyoshi Ohashi, Astuko Yamaguchi, Osamu Inoue, Takumichi Sutani, Naoto Horiguchi, Jürgen Bömmels, Christopher Wilson, Basoene Briggs, Chi Lim Tan, Tom Raymaekers, Romain Delhougne, Geert Van den Bosch, Luca Di Piazza, Gouri Sankar Kar, Arnaud Furnémont, Andrea Fantini, Gabriele Luca Donadio, Laurent Souriau, Davide Crotti, Farrukh Yasin, Raf Appeltans, Siddharth Rao, Danilo De Simone, Paulina Rincon Delgadillo, Philippe Leray, Anne-Laure Charley, Daisy Zhou, Anabela Veloso, Nadine Collaert, Kazuhisa Hasumi, Shunsuke Koshihara, Masami Ikota, Yutaka Okagawa, Toru Ishimoto
Proceedings Volume 10145, 1014512 (2017) https://doi.org/10.1117/12.2257468
KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, 3D metrology, Back end of line, Logic, Standards development, Germanium, Algorithm development, Process control, Resistance, Overlay metrology, Oxides, Etching, Statistical analysis

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