Dr. Ruoping Wang Profile

Dr. Ruoping Wang

Sr. Development Engineer at NXP Semiconductors

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Publications (5)

Proceedings Article | 20 March 2018 Paper

Pattern analysis and classification accelerates OPC tuning, monitoring, and optimization and mask inspection

Ruoping Wang, Paul Lupa, Jason Sweis, Ya-Chieh Lai, Philippe Hurat

Proceedings Volume 10588, 105880L (2018) https://doi.org/10.1117/12.2297097

KEYWORDS: Optical proximity correction, Inspection, Metrology, Image classification, Photomasks, Resolution enhancement technologies, Algorithm development, Standards development, Classification systems, Profiling

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Proceedings Article | 6 May 2005 Paper

Approximation of three dimensional mask effects with two dimensional features

Min Bai, Lawrence Melvin, Qiliang Yan, James Shiely, Bradley Falch, Chong-Cheng Fu, Ruoping Wang

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600547

KEYWORDS: 3D modeling, Photomasks, Optical proximity correction, Calibration, Data modeling, Transmittance, Phase shifts, Reticles, Lithography, 3D metrology

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Proceedings Article | 6 December 2004 Paper

Development of a complementary phase-shift mask process for 90-nm node technology

Ruoping Wang, Cece Philbin, Chong-Cheng Fu, Bill Wilkinson

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569311

KEYWORDS: Optical proximity correction, Photomasks, Chromium, Phase shifts, Data modeling, Model-based design, Critical dimension metrology, Reticles, Binary data, Tolerancing

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Proceedings Article | 11 March 2002 Paper

Polarized phase shift mask: concept, design, and potential advantages to photolithography process and physical design

Ruoping Wang, Warren Grobman, Alfred Reich, Matthew Thompson

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458317

KEYWORDS: Photomasks, Phase shifts, Polarization, Printing, Optical lithography, Manufacturing, Neodymium, Opacity, Quartz, Integrated circuits

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Proceedings Article | 14 September 2001 Paper

Effects of complementary phase-shift imaging on gate CD control

Carla Nelson-Thomas, Michael Kling, Matthew Thompson, Ruoping Wang, Nigel Cave, Chong-Cheng Fu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435746

KEYWORDS: Critical dimension metrology, Phase shifts, Binary data, Optical lithography, Optical proximity correction, Cadmium, Data conversion, Chromium, Semiconducting wafers, Logic

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