Dr. Sang-Ho Lee Profile

Dr. Sang-Ho Lee

at SK Hynix Inc

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Author

Publications (10)

Proceedings Article | 27 April 2023 Poster + Paper

Residuals reduction in imaging-based overlay using color per layer

Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar

Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681

KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization

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Proceedings Article | 13 June 2022 Presentation

Evaluation of robust EPE monitoring and control metric methodologies for advanced DRAM nodes yield improvement

Yaniv Abramovitz, Jeong-Ho Yeo, Taekwon Jee, Hong-Goo Lee, Sang-Ho Lee, Chan-Ha Park

Proceedings Volume PC12053, PC120530N (2022) https://doi.org/10.1117/12.2613931

KEYWORDS: Overlay metrology, Image processing, Yield improvement, Metrology, Line edge roughness, Process control, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Inspection

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

Advanced CD uniformity correction using radial basis function (RBF) models

Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Dongsub Choi, Jeonghoon Lee

Proceedings Volume 12053, 1205314 (2022) https://doi.org/10.1117/12.2607571

KEYWORDS: Semiconducting wafers, Data modeling, Scanners, Critical dimension metrology, Performance modeling, Mathematical modeling, Etching, Error analysis, Algorithm development, Zernike polynomials, Modeling, Modeling and simulation

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Proceedings Article | 26 May 2022 Presentation + Paper

Overlay stability control in IBO measurement using rAIM target

Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, Dongyoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120530E (2022) https://doi.org/10.1117/12.2608053

KEYWORDS: Overlay metrology, Process control, Optical lithography, Metrology, Inspection, Semiconducting wafers, Data modeling, Wafer-level optics, Optical properties, Optical design

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Proceedings Article | 26 May 2022 Poster + Paper

Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits

Vladimir Levinski, Yuri Paskover, Sharon Aharon, Daria Negri, Nadav Gutman, K. Nireekshan Reddy, Jeongpyo Lee, Hedvi Spielberg, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Hongseok Jang, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120531Z (2022) https://doi.org/10.1117/12.2613981

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Integrated circuits, Wafer-level optics, Scanners, Principal component analysis, Manufacturing, Inspection, Accuracy assessment

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Proceedings Article | 25 May 2022 Poster + Paper

Metal oxide resist (MOR) EUV lithography processes for DRAM application

Shinichiro Kawakami, Tomoya Onitsuka, Yuya Kamei, Satoru Shimura, Chan Ha Park, Sang Ho Lee, Hong Goo Lee, Jae Wook Seo, Jin il Kim, Jun ho Roh, Jin Hyung Kim, Ki Lyoung Lee, Seiji Nagahara, Jeoung Yun Kim, Jang Hwan Kim, Shingo Inaba, Jong Eun Park

Proceedings Volume 12055, 120550N (2022) https://doi.org/10.1117/12.2613974

KEYWORDS: Metals, Contamination, Semiconducting wafers, Optical lithography, Extreme ultraviolet lithography, Contamination control, Coating, Bridges, Manufacturing, Oxides

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Proceedings Article | 22 February 2021 Presentation + Paper

Qualification of small alignment mark by on-product overlay performance

Jigang Ma, Frans Bijnen, Edo Hulsebos, Lukasz Macht, Sotirios Tsiachris, Jin Dai, Rob van der Meulen, Miao Yu, Paul Böcker, Jung-Hwan Kim, Hyun Kim, Gwang-Gon Kim, Joon-Seuk Lee, Eung-Ryong Oh, Hong-Bok Yeon, Young-Deuk Kim, Seung-Uk Jeong, Sang-Ho Lee, Chan-Ha Park

Proceedings Volume 11613, 116130J (2021) https://doi.org/10.1117/12.2584618

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Algorithm development, Semiconductor manufacturing, Scanners, Process control, Device simulation

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Proceedings Article | 22 February 2021 Presentation + Paper

Statistical process optimization method for metrology equipment

Dongsoo Kim, Moran Zaberchik, Chen Li, Honggoo Lee, Chanha Park, Sangho Lee, Dongyoung Lee, Scott Beatty, Jae Park, Ramkumar Karur-Shanmugam, Telly Koffas, Dohwa Lee, Sanghuck Jeon, Dongsub Choi, Efi Megged, Nir BenDavid, Hedvi Spielberg

Proceedings Volume 11611, 1161123 (2021) https://doi.org/10.1117/12.2583638

KEYWORDS: Optimization (mathematics), Metrology, Semiconducting wafers, Statistical methods, Statistical analysis, Time metrology, Overlay metrology, Diffractive optical elements

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Proceedings Article | 22 February 2021 Presentation + Paper

Edge placement error wafer mapping and investigation for improvement in advanced DRAM node

Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park, Jonggeun Won, Nang-Lyeom Oh, Hsin-Yu Chen, WeiTai Lin, Chih-Hung Hsieh, Kuo-Feng Pao, Kyoyeon Cho, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Taekwon Jee, Seung-Uk Jeong, Jeongwoo Jae, Sang-Woo Kim, Dongyoung Lee, Jungchan Kim, WonKwang Ma, Sang-Ho Lee, Chan-Ha Park

Proceedings Volume 11611, 116111V (2021) https://doi.org/10.1117/12.2584149

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Optical lithography, Metrology, Visualization, Statistical analysis, Lithography, Graphic design, Etching

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Proceedings Article | 22 February 2021 Presentation

Memory OPO improvement using novel target design

Eitan Hajaj, Honggoo Lee, Chanha Park, Sangho Lee, Dongyoung Lee, Dohwa Lee, Dongsoo Kim, Sanghuck Jeon, Dongsub Choi, Eltsafon Ashwal, Chen Dror, Raviv Yohanan, Zephyr Liu, xiaolei liu, Diana Shaphirov, Katya Gordon, Mark Ghinovker

Proceedings Volume 11611, 1161137 (2021) https://doi.org/10.1117/12.2584524

KEYWORDS: Overlay metrology, Optical parametric oscillators, Standards development, Manufacturing, Integrated circuits

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Showing 5 of 10 publications

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