Dr. Sara Loi Profile

Dr. Sara Loi

Imaging Senior Engineer at STMicroelectronics

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Author

Publications (5)

Proceedings Article | 25 March 2008 Paper

In-line focus-dose monitoring for hyper NA imaging

Sara Loi, Alejandro Fasciszewski Zeballos, Umberto Iessi, John Robinson, Pavel Izikson, Antonio Mani, Marco Polli

Proceedings Volume 6922, 69223H (2008) https://doi.org/10.1117/12.772904

KEYWORDS: Semiconducting wafers, Metrology, Data modeling, Neural networks, Scanners, Lithography, 3D modeling, Diffractive optical elements, Finite element methods, Photoresist processing

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Proceedings Article | 7 March 2008 Paper

Double patterning overlay and CD budget for 32 nm technology node

Umberto Iessi, Sara Loi, Antonio Salerno, Pierluigi Rigolli, Elio De Chiara, Catia Turco, Roberto Colombo, Marco Polli, Antonio Mani

Proceedings Volume 6924, 692428 (2008) https://doi.org/10.1117/12.772795

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Double patterning technology, Etching, Scanners, Metrology, Optical alignment, Lithography, Optical lithography

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Proceedings Article | 20 March 2006 Paper

Analysis of the combined impact of the laser spectrum, illuminator miscalibrations, and lens aberrations on the 90nm technology node imaging with off-axis illuminations

Sara Loi, Umberto Iessi, Robert Chung

Proceedings Volume 6154, 615434 (2006) https://doi.org/10.1117/12.655567

KEYWORDS: Fiber optic illuminators, Overlay metrology, Lithography, Lithographic illumination, Monochromatic aberrations, Critical dimension metrology, Metrology, Laser applications, Optical simulations, Photomasks

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Proceedings Article | 28 May 2004 Paper

Evaluation of IDEALSmile for 90-nm FLASH memory contact holes imaging with ArF scanner

Pietro Cantu, Gianfranco Capetti, Sara Loi, Marco Lupo, Annalisa Pepe, Kenji Saitoh, Kenji Yamazoe, Yasuo Hasegawa, Junji Iwasa, Olivier Toublan

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534065

KEYWORDS: Monochromatic aberrations, Printing, Photomasks, Optical proximity correction, Scanners, Binary data, Resolution enhancement technologies, Lithography, Spherical lenses, Visualization

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Proceedings Article | 28 May 2004 Paper

Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results

Gianfranco Capetti, Maddalena Bollin, Annalisa Pepe, Gina Cotti, Sara Loi, Umberto Iessi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533707

KEYWORDS: Diffraction, Binary data, Photomasks, Lithographic illumination, Lithography, Nanoimprint lithography, Scanners, Semiconducting wafers, Resolution enhancement technologies, Edge roughness

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