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Generally, optical multilayer coatings are formed on the optical surface for the purpose of anti-reflection. However, these coatings have problems of environmental resistance such that cracks or peelings.
Lately, a technique for realizing an anti-reflection function by forming a sub-wavelength scale structure on the optical surface has been widely studied [1] [2] [3] [4] [5] [6]. Such a structure is called ARS, Anti-Reflective Structure. ARS has excellent environmental resistance compared to multilayer coatings and has the advantage of low dependence on the incidence angle in terms of optical characteristics.
We have studied a method for fabricating ARS using RIE, Reactive Ion Etching. We found that ARS with fine optical properties is formed on the surface of the glass lens by adjusting plasma condition at each etching process. In this report, we will introduce examples of applications to quartz glass. The first case is ARS for the visible light, which achieved a transmittance of 99% or higher. The other is ARS for the deep ultraviolet light. In addition, these ARS have characteristic of water repellency which is useful for optical components.
In general, a plurality of lenses in MLA are regularly arranged, and this arrangement causes light interference. Since the light amount unevenness occurred due to the interference, the unevenness could be reduced by arranging the lenses at random in three axes. The light amount unevenness was also caused by transfer errors that occurred in the molding process. The shape error of lens was controlled to nanometer-size by developing a correction process that functioned the shape error and adapted it to mold processing. Although a high refractive resin was used to widen the projection angle, it was difficult to manufacture a thin lens by injection molding because of the high viscosity. This problem was also solved by developing a heating and cooling method in the molding process. As a result, by optimizing the lens arrangement and controlling the error of the lens shape, the light amount unevenness of projection could be suppressed to 10% or less.
What we have developed is new mask-less method which is no need for resist patterning and possible to impart an anti-reflection structure to large area and curved lens surface, and can be expected to apply to various market segments. We report developed technique and characteristics of production lens.
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