Dr. Shigehiro Hara Profile

Dr. Shigehiro Hara

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 29 September 2010 Paper

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

Takashi Kamikubo, Takayuki Ohnishi, Shigehiro Hara, Hirohito Anze, Yoshiaki Hattori, Shuichi Tamamushi, Shufeng Bai, Jen-Shiang Wang, Rafael Howell, George Chen, Jiangwei Li, Jun Tao, Jim Wiley, Terunobu Kurosawa, Yasuko Saito, Tadahiro Takigawa

Proceedings Volume 7823, 782331 (2010) https://doi.org/10.1117/12.865822

KEYWORDS: Extreme ultraviolet, Data modeling, Photomasks, Scattering, Monte Carlo methods, Point spread functions, Process modeling, Electron beams, Tantalum, Chromium

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Proceedings Article | 27 May 2010 Paper

Performance and stability of mask process correction for EBM-7000

Yasuko Saito, George Chen, Jen-Shiang Wang, Shufeng Bai, Rafael Howell, Jiangwei Li, Jun Tao, Doug VanDenBroeke, Jim Wiley, Tadahiro Takigawa, Takayuki Ohnishi, Takashi Kamikubo, Shigehiro Hara, Hirohito Anze, Yoshiaki Hattori, Shuichi Tamamushi

Proceedings Volume 7748, 774814 (2010) https://doi.org/10.1117/12.867969

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet, Manufacturing, Metrology, Time metrology, EUV optics, Computational lithography, Scattering, Optical lithography

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Proceedings Article | 11 May 2007 Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node

Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi

Proceedings Volume 6607, 660703 (2007) https://doi.org/10.1117/12.728917

KEYWORDS: Line edge roughness, Photomasks, Control systems, Standards development, Manufacturing, Monochromatic aberrations, Electron beam melting, Photoresist processing, Beam shaping, Electron beams

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Proceedings Article | 20 May 2006 Paper

EBM-5000: electron-beam mask writer for 45 nm node

Hitoshi Sunaoshi, Yuichi Tachikawa, Hitoshi Higurashi, Tomohiro Iijima, Junichi Suzuki, Takashi Kamikubo, Kenji Ohtoshi, Hirohito Anze, Takehiko Katsumata, Noriaki Nakayamada, Shigehiro Hara, Shuichi Tamamushi, Yoji Ogawa

Proceedings Volume 6283, 628306 (2006) https://doi.org/10.1117/12.681732

KEYWORDS: Photomasks, Line edge roughness, Error analysis, Electron beams, Manufacturing, Data conversion, Electron beam melting, Optical proximity correction, Electro optical systems

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Proceedings Article | 20 August 2004 Paper

Improvement of unified mask data formats for EB writers

Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shigehiro Hara, Koki Kuriyama, Morihisa Hoga, Satoshi Watanabe, Hidemichi Kawase, Tomoko Kamimoto, Kokoro Kato

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557738

KEYWORDS: Data conversion, Photomasks, Vestigial sideband modulation, Manufacturing, Data compression, Printing, Prototyping, Resolution enhancement technologies, Semiconductors, Nanotechnology

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Proceedings Article | 28 August 2003 Paper

Unified mask data formats for EB writers

Koki Kuriyama, Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojo, Yuichi Kawase, Shigehiro Hara, Morihisa Hoga, Satoshi Watanabe, Masa Inoue, Hidemuchi Kawase, Tomoko Kamimoto

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504218

KEYWORDS: Photomasks, Manufacturing, Vestigial sideband modulation, Data modeling, Data conversion, Data processing, Semiconductors, Instrument modeling, Resolution enhancement technologies, Optical proximity correction

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Proceedings Article | 27 December 2002 Paper

Development of new stream format with GDSII upper compatibility and high compression rate

Koki Kuriyama, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojo, Yuichi Kawase, Shigehiro Hara, Morihisa Hoga, Satoshi Watanabe, Masaru Inoue, Hidemuchi Kawase, Tomoko Kamimoto

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467910

KEYWORDS: Data conversion, Manufacturing, Photomasks, Optical proximity correction, Software development, Electronic design automation, Data processing, Data compression, Standards development, Data modeling

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Proceedings Article | 25 August 1999 Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360219

KEYWORDS: Photomasks, Data conversion, Mask making, Lithography, Distortion, Electron beams, Manufacturing, Critical dimension metrology, Vibration control, Sensors

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Proceedings Article | 24 July 1996 Paper

Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system

Shigehiro Hara, Eiji Murakami, Shunko Magoshi, Kiyomi Koyama, Hirohito Anze, Yoji Ogawa, A. Kabeya, S. Ooki, Tamaki Saito, T. Fujii, S. Sakamoto, Hiromi Suzuki, Mitsuhiro Yano, Sadakazu Watanabe

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245217

KEYWORDS: Data conversion, Computer aided design, Metals, Data processing, Mask making, Boron, Microelectronics, Solids, Chlorine, Algorithm development

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Proceedings Article | 27 May 1996 Paper

CD uniformity of photomasks written with high-voltage variable-shaped e beam

Noriaki Nakayamada, Shigehiro Hara, Toshiyuki Magoshi, Hideaki Sakurai, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240462

KEYWORDS: Vestigial sideband modulation, Photomasks, Calibration, Critical dimension metrology, Laser scattering, Scattering, Error analysis, Electron beam lithography, Optics manufacturing, Photoresist processing

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Showing 5 of 10 publications

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