Among several approaches proposed to achieve high-efficiency III-V multi-junction solar cells, the most promising approach is to incorporate a bottom junction consisting of a 1 – 1.25 eV material. In particular, several research groups have studied MBE- and MOVPE-grown 1 – 1.25 eV bulk (In)GaAsN(Sb) dilute nitride lattice matched to GaAs substrates, but it is a challenge to grow dilute nitrides without introducing a number of localized states or defects. Localized states originating from random distributions of nitrogen sites in dilute nitrides behave as highly efficient traps, leading to short minority carrier lifetimes. As our group previously reported, carrier dynamics studies are indispensable in the optimization of dilute nitride materials growth to achieve improved solar cell performance. Also, bismide QW heterostructures have recently received a great deal of attention for applications in solar cells and semiconductor lasers because theoretical studies have predicted reduction in nonradiative recombination in Bicontaining materials. For the present study, we employed time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in MOVPE-grown bulk (In)GaAsN(Sb) materials nominally lattice matched to GaAs substrates. Compared to our previous samples, our present samples grown using different metalorganic precursors at higher growth temperatures showed a significantly less background C doping density. Carrier lifetimes were measured from such dilute nitride samples with low C doping density at various temperatures between 10K and RT. We also performed preliminary TR-PL measurements on MOVPE-grown bismide QW heterostructures at low temperatures. Carrier lifetimes were measured from as-grown and annealed bismide QW structures consisting of GaAsBi(P) wells and GaAsP barriers. Lastly, TEM cross sections were prepared from both dilute nitride and bismide samples for defect and composition analysis using a high resolution TEM.
Strained-layer superlattice (SL) structures have been grown by metalorganic vapor phase epitaxy
(MOVPE) on metamorphic buffer layers (MBLs) for application in intersubband-transition devices,
such as quantum cascade lasers. Using the MBL as an adjustable lattice-parameter platform, we have
designed relatively-low-strain quantum-cascade-laser structures that will emit in the 3.0-3.5 μm
wavelength range while suppressing carrier leakage from the upper laser level. Thick (10-12 μm)
compositionally-graded, hydride-vapor-phase-epitaxy (HVPE)-grown MBL structures are employed.
To improve the planarity of the MBL surface, we employ chemical mechanical polishing (CMP)
followed by wet chemical etching prior to the growth of the SL/device structures. We find that the
wet-chemical etching step is crucial to remove residual damage introduced during CMP. 20-period
InxGa1-xAs (wells)/AlyIn1-yAs (barriers) SLs grown on the MBLs are characterized by x-ray
diffraction (XRD). Intersubband electroluminescence emission is observed in the 3.5 μm wavelength
range from devices employing such SL structures.
III-V multi-junction solar cells are typically based on a triple-junction design that consists of an InGaP top junction, a GaAs middle junction, and a bottom junction that employs a 1 – 1.25 eV material grown on GaAs substrates. The most promising 1 – 1.25 eV material that is currently under extensive investigation is bulk dilute nitride such as (In)GaAsNSb lattice matched to GaAs substrates. The approach utilizing dilute nitrides has a great potential to achieve high performance triple-junction solar cells as recently demonstrated by Wiemer, et al., who achieved a record efficiency of 43.5% from multi-junction solar cells including MBE-grown dilute nitride materials [1]. Although MOVPE is a preferred technique over MBE for III-V multi-junction solar cell manufacturing, MOVPEgrown dilute nitride research is at its infancy compared to MBE-grown dilute nitride. In particular, carrier dynamics studies are indispensible in the optimization of MOVPE materials growth parameters to obtain improved solar cell performance. For the present study, we employed time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in MOVPE-grown bulk dilute nitride InGaAsN materials (Eg = 1 – 1.25 eV at RT) lattice matched to GaAs substrates. In contrast to our earlier samples that showed high background C doping densities, our current samples grown using different metalorganic precursors at higher growth temperatures showed a significantly reduced background doping density of ~ 1017 /cm3. We studied carrier dynamics in (In)GaAsNSb double heterostructures (DH) with different N compositions at room temperature. Post-growth annealing yielded significant improvements in carrier lifetimes of (In)GaAsNSb double heterostructure (DH) samples. Carrier dynamics at various temperatures between 10 K and RT were also studied from (In)GaAsNSb DH samples including those samples grown on different orientation substrates.
III-V multi-junction solar cells are based on a triple-junction design that consists of an InGaP top junction, a GaAs middle junction, and a bottom junction that employs either a 1eV material grown on the GaAs substrate or InGaAs grown on the Ge substrate. The most promising 1 eV material that is currently under extensive investigation is bulk dilute nitride such as InGaAsN(Sb) lattice matched to GaAs substrates. Both approaches utilizing dilute nitrides and lattice-mismatched InGaAs layers have a potential to achieve high performance triple-junction solar cells. In addition, it will be beneficial for both commercial and space applications if III-V triple-junction solar cells can significantly reduce weight and can be manufactured cost effectively while maintaining high efficiency. The most attractive approach to achieve these goals is to employ full-wafer epitaxial lift off (ELO) technology, which can eliminate the substrate weight and also enable multiple substrate re-usages. For the present study, we employed time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in MOVPE-grown bulk dilute nitride layers lattice matched to GaAs substrates, where carrier lifetime measurements are crucial in optimizing MOVPE materials growth. We studied carrier dynamics in InGaAsN(Sb) layers with different amounts of N incorporated. Carrier lifetimes were also measured from InGaAsN(Sb) layers at different stages of post-growth thermal annealing steps. Post-growth annealing yielded significant improvements in carrier lifetimes of InGaAsNSb double hetero-structure (DH) samples compared to InGaAsN DH samples possibly due to the surfactant effect of Sb. In addition, we studied carrier dynamics in MOVPE-grown GaAs-InAl(Ga)P layers grown on GaAs substrates. The structures were grown on top of a thin AlAs release layer, which allowed epitaxial layers grown on top of the AlAs layer to be removed from the substrate. The GaAs layers had various doping densities and thicknesses. We present our TR-PL results from both pre- and post-ELO processed GaAs-InAl(Ga)P samples.
Bulk InGaAs layers with a 1eV band-gap grown on GaAs substrates are attractive for high efficiency multi-junction
solar cells. However, a large amount of lattice mismatch between bulk InGaAs layer and GaAs substrate
necessitates development of novel metamorphic buffer layers (MBL). A number of research groups have reported
various MBLs for applications including HBTs, HEMTs, lasers, and solar cells. In this study, we report carrier
dynamics and defects in MOVPE-grown bulk InGaAs layers (Eg = ~ 1.0 - 1.1 eV at 300K) with two different types
of MBLs including InGaAs and InGaPSb. We also report the effect of chemical-mechanical polishing (CMP)
process on carrier lifetimes and the properties of the films subsequently grown on top of the MBL. We employed
time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in InxGa1-xAs samples with and
without the CMP process and a high resolution TEM to study defects in various structures.
Bulk, lattice-matched InGaAsSbN material has been grown by metal organic vapor phase epitaxy (MOVPE) for
applications in concentrated multi-junction solar cells. By optimizing the growth conditions for high Sb and As
partial pressures, we achieved background hole concentrations as low as 2 x 1018 cm-3. After thermal annealing,
the background hole concentration increased from 2x1018 to 2 x 1019 cm-3, although PL intensity increased by a
factor of 7. We recently grew single junction (1eV) solar cells incorporating dilute-nitride materials and devices
were fabricated and characterized for solar cell application. Performance characteristics of these cells without
anti-reflection coating included the efficiency of 4.25% under the AM1.5 (air mass) direct illumination, Voc of
0.7 V, and a spectral response extended to longer wavelength compared with GaAs cells.
Dilute nitride materials with a 1eV band-gap lattice matched to GaAs substrates are attractive for high-efficiency
multi-junction solar cells. Carrier lifetime measurements are crucial in optimizing material growth and p-i-n field-aided
carrier-extraction-device design. One research group has reported carrier lifetimes of MBE-grown bulk
InGaNAsSb materials, but there has been no report of carrier lifetime measurements from bulk InGaNAsSb grown
by MOVPE. In this study, we report the growth of bulk InGaNAsSb by MOVPE and the first carrier lifetime
measurement from MOVPE-grown bulk InGaNAsSb materials with Eg= 1.0 - 1.2eV at 300K. We studied carrier
dynamics in MOVPE-grown bulk dilute nitride materials nominally lattice matched to GaAs (100) substrates: 1μm
thick In0.035GaN0.025As (Eg= 1.0eV at 300K) and ~0.2μm thick In(0.05-0.07)GaN(0.01-0.02)AsSb(0.02-0.06) layers (Eg= 1.2eV
at 300K). Both structures are fully strained. The incorporation of N in InGaNAs leads to degradation in
photoluminescence efficiency, but prior studies indicate the addition of Sb in MBE-grown InGaNAsSb improved the
PL efficiency. Two-step post-growth thermal annealing processes were optimized to obtain maximum PL
efficiencies that yielded a typical blue shift of 50 and 30meV for InGaNAs and InGaNAsSb, respectively. We
employed a streak camera to measure carrier lifetimes from both as-grown and thermally annealed samples. Carrier
lifetimes of <30psec were obtained from the InGaNAs samples, whereas carrier lifetimes of up to ~150psec were
obtained from the InGaNAsSb samples. We discuss possible reasons for short carrier lifetimes measured from
MOVPE-grown InGaNAs(Sb) materials.
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