CONFERENCE PROCEEDINGS
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Takahiro Yoshida
at Canon Inc
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Author
Publications (3)
SPIE Journal Paper | 4 January 2022
Overlay models for nanoimprint lithography
Nilabh Roy, Mario Meissl, Takahiro Yoshida, Anshuman Cherala, Xiaoming Lu, Jeff Klein, Mingji Lou, Jin Choi, Hiroyuki Sekiguchi, Takashi Shibayama, Mitsuru Hiura
JM3, Vol. 21, Issue 01, 011004, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011004
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Overlay metrology, Head, Actuators, Calibration, Distortion, Photomasks, Optical lithography, Error analysis
Proceedings Article | 1 March 2021 Presentation + Paper
Overlay models for nanoimprint lithography
Nilabh Roy, Mario Meissl, Takahiro Yoshida, Anshuman Cherala, Xiaoming Lu, Jeffrey Klein, Mingji Lou, Jin Choi, Hiroyuki Sekiguchi, Takashi Shibayama, Mitsuru Hiura
Proceedings Volume 11610, 1161006 (2021) https://doi.org/10.1117/12.2584742
KEYWORDS: Nanoimprint lithography, Overlay metrology, Optical alignment, Semiconducting wafers, Photomasks, Wafer testing, Optical lithography, Ultraviolet radiation, Signal processing, Lithography
Proceedings Article | 21 March 2017 Presentation + Paper
Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance
Yukio Takabayashi, Mitsuru Hiura, Hiroshi Morohoshi, Nobuhiro Kodachi, Tatsuya Hayashi, Atsushi Kimura, Takahiro Yoshida, Kazuhiko Mishima, Yoshio Suzaki, Jin Choi
Proceedings Volume 10144, 1014405 (2017) https://doi.org/10.1117/12.2258385
KEYWORDS: Photomasks, Nanoimprint lithography, Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Semiconductor manufacturing, Lithography, Semiconductors, Particles, Actuators, Source mask optimization
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