Mr. Takanori Kawakami Profile

Takanori Kawakami

at JSR

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 14 May 2022

Multiple regression analysis of postdevelop unbiased line width roughness and etch resistance for high-accuracy estimations of postetch pattern roughness

Mihyun Lee, Masayuki Miyake, Noboru Otsuka, Takanori Kawakami, Hyun-Woo Kim, Suk-Koo Hong

JM3, Vol. 21, Issue 02, 024601, (May 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.024601

KEYWORDS: Line width roughness, Etching, Resistance, Scanning electron microscopy, Photoresist developing, Optical lithography, Carbon, Photoresist materials, Materials processing, Lithography

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Proceedings Article | 16 April 2011 Paper

Polymer-bound photobase generators and photoacid generators for pitch division lithography

Younjin Cho, Xinyu Gu, Yuji Hagiwara, Takanori Kawakami, Toshiyuki Ogata, Brandon Rawlings, Yongjun Li, Arun Sundaresan, Nicholas Turro, Robert Bristol, James Blackwell, C. Grant Willson

Proceedings Volume 7972, 797221 (2011) https://doi.org/10.1117/12.879771

KEYWORDS: Polymers, Lithography, Line edge roughness, NOx, Analog electronics, Photomasks, Polymerization, Chlorine, Molecules, Ultraviolet radiation

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Proceedings Article | 16 April 2011 Paper

Photobase generator enabled pitch division: a progress report

Xinyu Gu, Younjin Cho, Takanori Kawakami, Yuji Hagiwara, Brandon Rawlings, Ryan Mesch, Toshiyuki Ogata, Taeho Kim, Takehiro Seshimo, Wade Wang, Arun Sundaresan, Nicholas Turro, Roel Gronheid, James Blackwell, Robert Bristol, C. Grant Willson

Proceedings Volume 7972, 79720F (2011) https://doi.org/10.1117/12.879861

KEYWORDS: Line edge roughness, Polymers, Lithography, Diffusion, Optical lithography, Photomasks, Chemical analysis, Scanning electron microscopy, Absorbance, Chemistry

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Proceedings Article | 1 April 2009 Paper

Feasibility study of non-topcoat resist for 22nm node devices

Koutaro Sho, Hirokazu Kato, Katsutoshi Kobayashi, Kazunori Iida, Tomoya Ori, Daizo Muto, Tsukasa Azuma, Shinichi Ito, Tomoharu Fujiwara, Yuuki Ishii, Yukio Nishimura, Takanori Kawakami, Motoyuki Shima

Proceedings Volume 7273, 72733B (2009) https://doi.org/10.1117/12.812475

KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Line width roughness, Thin film coatings, Lithography, Scanners, Chemical species, Defect inspection, Immersion lithography

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Proceedings Article | 23 March 2007 Paper

High-performance 193-nm photoresists based on fluorosulfonamide

Wenjie Li, Kuang-Jung Chen, Ranee Kwong, Margaret Lawson, Mahmoud Khojasteh, Irene Popova, P. Rao Varanasi, Tsutomu Shimokawa, Yoshikazu Yamaguchi, Shiro Kusumoto, Makoto Sugiura, Takanori Kawakami, Mark Slezak, Gary Dabbagh, Zhi Liu

Proceedings Volume 6519, 65190F (2007) https://doi.org/10.1117/12.712231

KEYWORDS: Polymers, Etching, Fluorine, Resistance, Lithography, Immersion lithography, 193nm lithography, Chemical species, Photoresist materials, Lithographic illumination

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Proceedings Article | 21 March 2007 Paper

Various factors of the image blur in chemically amplified resist

Takanori Kawakami, Tomoki Nagai, Yukio Nishimura, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa

Proceedings Volume 6519, 65193K (2007) https://doi.org/10.1117/12.712088

KEYWORDS: Diffusion, Polymers, Modulation transfer functions, Lithography, Chemically amplified resists, Neodymium, Photoresist materials, Photoresist processing, Coating, Polymer thin films

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Showing 5 of 6 publications

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