CONFERENCE PROCEEDINGS
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Takayoshi Abe
at JSR Engineering Co Ltd
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Author
Publications (2)
Proceedings Article | 26 March 2008 Paper
Sub-40-nm half-pitch double patterning with resist freezing process
Masafumi Hori, Tomoki Nagai, Atsushi Nakamura, Takayoshi Abe, Gouji Wakamatsu, Tomohiro Kakizawa, Yuusuke Anno, Makoto Sugiura, Shiro Kusumoto, Yoshikazu Yamaguchi, Tsutomu Shimokawa
Proceedings Volume 6923, 69230H (2008) https://doi.org/10.1117/12.772403
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Water, Etching, Immersion lithography, Photoresist processing, Optical lithography, Lithography, Critical dimension metrology, Double patterning technology
Proceedings Article | 4 May 2005 Paper
Contact hole shrink process with novel chemical shrink materials
Takayoshi Abe, Tooru Kimura, Takashi Chiba, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598960
KEYWORDS: Photoresist processing, Process control, Lithography, Polymers, Photoresist developing, Image processing, 193nm lithography, Chemical reactions, Etching, Photoresist materials
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