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Tetsunori Hirata
at Tekscend Photomask Corp
SPIE Involvement:
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Publications (1)
Proceedings Article | 12 November 2024 Presentation + Paper
Mask performance improvement by pixel level dose correction
Mayuko Matsumoto, Naoki Yoshida, Tetsunori Hirata, Makoto Motegi, Kiyoshi Kageyama, Mitsuharu Yamana, Wataru Kunishima, Ryo Iikubo
Proceedings Volume 13216, 132160H (2024) https://doi.org/10.1117/12.3034611
KEYWORDS: Error control coding, Critical dimension metrology, Line edge roughness, Design, Semiconducting wafers, Extreme ultraviolet, Optical lithography, Photomasks, Modulation, Electron beam lithography
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