Dr. Thierry Moreno Profile

Dr. Thierry Moreno

Optics Group at Synchrotron SOLEIL

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Publications (8)

Proceedings Article | 23 September 2011 Paper

Undulator emission analysis: comparison between measurements and simulations

Thierry Moreno, Edwige Otero, Xiaohao Dong, Philippe Ohresser

Proceedings Volume 8141, 81410H (2011) https://doi.org/10.1117/12.893778

KEYWORDS: Polarization, Electron beams, Magnetism, Crystals, Optical simulations, Diffraction, Sensors, Laser crystals, X-rays, Synchrotrons

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Proceedings Article | 23 September 2011 Paper

Ray tracing application in hard x-ray optical development: Soleil first wiggler beamline (PSICHÉ) case

Xiaohao Dong, Thierry Moreno, Nicolas Guignot, Jean-Paul Itié

Proceedings Volume 8141, 814113 (2011) https://doi.org/10.1117/12.893643

KEYWORDS: Mirrors, Crystals, Ray tracing, Laser crystals, Reflectivity, Hard x-rays, Diffraction, Geometrical optics, X-ray optics, Optical components

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Proceedings Article | 18 June 2007 Paper

Surface metrology with a stitching Shack-Hartmann profilometric head

J. Floriot, X. Levecq, S. Bucourt, M. Thomasset, F. Polack, M. Idir, P. Mercère, S. Brochet, T. Moreno

Proceedings Volume 6616, 66162A (2007) https://doi.org/10.1117/12.726058

KEYWORDS: Wavefront sensors, Mirrors, Head, Wavefronts, Spherical lenses, Metrology, Calibration, Microlens, Synchrotrons, Surface finishing

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Proceedings Article | 17 September 2005 Paper

X-ray beam metrology and X-ray optic alignment by Hartmann wavefront sensing

Pascal Mercere, Samuel Bucourt, Gilles Cauchon, Denis Douillet, Guillaume Dovillaire, Kenneth Goldberg, Mourad Idir, Xavier Levecq, Thierry Moreno, Patrick Naulleau, Senajith Rekawa, Philippe Zeitoun

Proceedings Volume 5921, 592109 (2005) https://doi.org/10.1117/12.622799

KEYWORDS: Extreme ultraviolet, Sensors, Imaging systems, Mirrors, X-rays, Hard x-rays, X-ray optics, Calibration, Active optics, Wavefront sensors

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Proceedings Article | 17 September 2005 Paper

New optical setup for the generation of variable spot size on third generation synchrotron beamlines

Thierry Moreno, Rachid Belkhou, Gilles Cauchon, Mourad Idir

Proceedings Volume 5921, 59210F (2005) https://doi.org/10.1117/12.622942

KEYWORDS: Mirrors, Nanospectroscopy, X-rays, Synchrotrons, Modulation, Zoom lenses, Spherical lenses, Optical simulations, Monochromators, Error analysis

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Proceedings Article | 10 November 1998 Paper

Ground-calibration GSE for the XMM-EPIC instrument at the Orsay Synchrotron facility

Massimo Trifoglio, Fulvio Gianotti, John Stephen, M. Balasini, Jean-Francois Hochedez, Lucio Chiappetti, R. Glukhov, Olivier Hainaut, Erick Jourdain, Nicola La Palombara, Philippe Marty, T. Moreno, C. Musso

Proceedings Volume 3445, (1998) https://doi.org/10.1117/12.330287

KEYWORDS: Calibration, Cameras, Data archive systems, Synchrotrons, X-rays, Data acquisition, CCD cameras, Molybdenum, Optical filters, Charge-coupled devices

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Proceedings Article | 1 January 1992 Paper

Magnesium-silicide-based multilayers for soft x-ray optics

Pierre Boher, Philippe Houdy, Louis Hennet, Zhigang Li, Abhijit Modak, David Smith, M. Idir, T. Moreno, Robert Barchewitz, Mikhael Kuehne, Peter Mueller, Jean-Pierre Delaboudiniere

Proceedings Volume 1546, (1992) https://doi.org/10.1117/12.51211

KEYWORDS: X-rays, Magnesium, Silicon, Multilayers, Interfaces, Tungsten, Reflectivity, Californium, X-ray optics, Grazing incidence

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Using a diode rf-sputtering technique, different magnesium silicide based multilayer systems have been deposited in very thin films for optical applications in the soft x-ray range. A detailed structural analysis of the different multilayers has been made using in-situ kinetic ellipsometry, ex-situ grazing x-ray reflection at the copper K-(alpha) line and transmission electron microscopy. The multilayer performances have been measured by synchrotron radiation at the magnesium K-(alpha) and L-(alpha) lines and related to the structural characteristics. For short wavelength, the W/Mg2Si system shows characteristics very similar to those of the more common W/Si system. Non-negligible interdiffusion and limited interface roughness allow the layer thicknesses to be reduced to very low values. Well-defined Bragg peaks are observed even when the double period is as low as 44 angstrom. First Bragg peak reflectivity as high as 31 has been measured at 9.89 angstrom for a multilayer with a double period equal to 84 angstrom and a limited number of periods. This preliminary result is very promising for future applications in the field of x-ray fluorescence analysis. W/Mg2Si and Si3N4/Mg2Si multilayers have also been fabricated for use at higher wavelengths around the Mg L-(alpha) line (286 angstrom). In the case of the W/Mg2Si multilayers have also been fabricated for use at higher wavelengths around the Mg L-(alpha) line (286 angstrom). In the case of the W/Mg2Si system, the tungsten layers are crystallized due to their higher thickness and consequently the interface roughness is slightly higher. In spite of this, more than 20 reflectivity at the first Bragg peak has been measured at normal incidence on different W/Mg2Si samples, with a selectivity two times better than conventional Mo/Si mirrors ((lambda) /(delta) (lambda) approximately equals 20). When we replace tungsten by a thin silicon nitride layer deposited by reactive sputtering, we increase the selectivity up to (lambda) /(delta) (lambda) approximately equals 30, and the thermal stability is drastically improved ( 800 degree(s)C).

Proceedings Article | 1 February 1991 Paper

Fabrication of multilayer Bragg-Fresnel zone plates for the soft x-ray range

Chantal Khan Malek, T. Moreno, Philippe Guerin, F. Ladan, Jean-Rene Rivoira, Robert Barchewitz

Proceedings Volume 1343, (1991) https://doi.org/10.1117/12.23231

KEYWORDS: Zone plates, Mirrors, Etching, X-rays, Reflectivity, Multilayers, Plasma, X-ray optics, Microfabrication, Electron beam lithography

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Showing 5 of 8 publications

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