Mr. Tomohiro Goto Profile

Tomohiro Goto

at SCREEN Holdings Co Ltd

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Author

Publications (6)

Proceedings Article | 27 April 2023 Presentation + Paper

Machine learning robustness in overlay metrology

Udi Shusterman, Grechin Sveta, Boaz Ophir, Cindy Kato, Masanobu Hayashi, Shengxun Zhao, Jiehong Ng, Tomohiro Goto, Atsushi Imada, Manabu Miyake, Yasuki Takeuchi, Hiroyuki Mizuochi

Proceedings Volume 12496, 124960M (2023) https://doi.org/10.1117/12.2657438

KEYWORDS: Semiconducting wafers, Education and training, Data modeling, High volume manufacturing, Overlay metrology, Machine learning, 3D modeling, Metrology, Performance modeling, Object detection

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Proceedings Article | 22 February 2021 Presentation + Paper

Machine learning for Tool Induced Shift (TIS) reduction: an HVM case study

Boaz Ophir, Udi Shusterman, Anna Golotsvan, Cindy Kato, Masanobu Hayashi, Richika Kato, Tomohiro Goto, Taketo Kuriyama, Manabu Miyake, Yasuki Takeuchi, Hiroyuki Mizuochi

Proceedings Volume 11611, 116110E (2021) https://doi.org/10.1117/12.2590247

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Proceedings Article | 19 March 2012 Paper

Accelerated purge drying to prevent pattern collapse without surfactant rinse for high-aspect ratio resist patterns

Tomohiro Goto, Charles Pieczulewski, Akihiko Morita

Proceedings Volume 8325, 83250S (2012) https://doi.org/10.1117/12.916322

KEYWORDS: Semiconducting wafers, Standards development, Photoresist processing, Critical dimension metrology, Capillaries, Lithography, Finite element methods, Optical lithography, Yield improvement, Scanners

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Proceedings Article | 1 April 2009 Paper

Backside EBR process performance with various wafer properties

Tomohiro Goto, Kazuhito Shigemori, Rik Vangheluwe, Daub Erich, Masakazu Sanada

Proceedings Volume 7273, 727329 (2009) https://doi.org/10.1117/12.814079

KEYWORDS: Semiconducting wafers, Immersion lithography, Particles, Thin film coatings, System integration, Coating, Chemical vapor deposition, Dielectrics, Carbon, Edge roughness

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Proceedings Article | 24 March 2008 Paper

Film stacking architecture for immersion lithography process

Tomohiro Goto, Masakazu Sanada, Tadashi Miyagi, Kazuhito Shigemori, Masashi Kanaoka, Shuichi Yasuda, Osamu Tamada, Masaya Asai

Proceedings Volume 6922, 69222X (2008) https://doi.org/10.1117/12.772411

KEYWORDS: Semiconducting wafers, Particles, Lithography, Coating, Diffractive optical elements, Immersion lithography, Thin film coatings, Inspection, Silicon, Scanning electron microscopy

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Proceedings Article | 29 March 2006 Paper

Analysis of the effect of mechanical strength of the resist film on pattern collapse behavior using atomic force microscope

Osamu Tamada, Tomohiro Goto, Masakazu Sanada, Takahiro Moriuchi, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 6153, 61533P (2006) https://doi.org/10.1117/12.651999

KEYWORDS: Refractive index, Photoresist processing, Temperature metrology, Atomic force microscope, Atomic force microscopy, Ellipsometry, Semiconducting wafers, Scanning electron microscopy, Head-mounted displays, Semiconductor manufacturing

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Showing 5 of 6 publications

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