Dr. Tristan Bret Profile

Dr. Tristan Bret

at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 1 April 2013 Paper

Modeling strategies for EUV mask multilayer defect dispositioning and repair

Andreas Erdmann, Peter Evanschitzky, Tristan Bret, Rik Jonckheere

Proceedings Volume 8679, 86790Y (2013) https://doi.org/10.1117/12.2011444

KEYWORDS: Photomasks, Printing, Extreme ultraviolet, Lithography, Multilayers, Atomic force microscopy, Semiconducting wafers, Optimization (mathematics), Critical dimension metrology, Systems modeling

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Proceedings Article | 8 November 2012 Paper

E-beam based mask repair as door opener for defect free EUV masks

Markus Waiblinger, Tristan Bret, Rik Jonckheere, Dieter Van den Heuvel

Proceedings Volume 8522, 85221M (2012) https://doi.org/10.1117/12.966387

KEYWORDS: Photomasks, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Reticles, Mirrors, Atomic force microscopy, Printing, Distortion, Inspection

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Proceedings Article | 23 March 2012 Paper

Analysis of EUV mask multilayer defect printing characteristics

Andreas Erdmann, Peter Evanschitzky, Tristan Bret, Rik Jonckheere

Proceedings Volume 8322, 83220E (2012) https://doi.org/10.1117/12.916411

KEYWORDS: Photomasks, Printing, Extreme ultraviolet, Multilayers, Semiconducting wafers, Computer simulations, Critical dimension metrology, Extreme ultraviolet lithography, Reflectivity, Lithography

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Proceedings Article | 23 March 2012 Paper

Closing the gap for EUV mask repair

T. Bret, R. Jonckheere, D. Van den Heuvel, C. Baur, M. Waiblinger, G. Baralia

Proceedings Volume 8322, 83220C (2012) https://doi.org/10.1117/12.918322

KEYWORDS: Photomasks, Scanning electron microscopy, Extreme ultraviolet, Atomic force microscopy, Semiconducting wafers, Reticles, Inspection, Mirrors, Etching, Printing

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Proceedings Article | 14 October 2011 Paper

Additional evidence of EUV blank defects first seen by wafer printing

Rik Jonckheere, Dieter Van den Heuvel, Tristan Bret, Thorsten Hofmann, John Magana, Israel Aharonson, Doron Meshulach, Eric Hendrickx, Kurt Ronse

Proceedings Volume 8166, 81660E (2011) https://doi.org/10.1117/12.901555

KEYWORDS: Printing, Inspection, Reticles, Semiconducting wafers, Extreme ultraviolet, Bismuth, Atomic force microscopy, Photomasks, Wafer inspection, Visualization

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Proceedings Article | 14 October 2011 Paper

Repair of natural EUV reticle defects

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, M. Waiblinger

Proceedings Volume 8166, 81661G (2011) https://doi.org/10.1117/12.898864

KEYWORDS: Semiconducting wafers, Photomasks, Printing, Scanning electron microscopy, Atomic force microscopy, Extreme ultraviolet, Inspection, Reticles, Visualization, Extreme ultraviolet lithography

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Proceedings Article | 5 October 2011 Paper

Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

Andreas Erdmann, Peter Evanschitzky, Feng Shao, Tim Fühner, Gian Lorusso, Eric Hendrickx, Mieke Goethals, Rik Jonckheere, Tristan Bret, Thorsten Hofmann

Proceedings Volume 8171, 81710M (2011) https://doi.org/10.1117/12.896813

KEYWORDS: Calibration, Photomasks, Data modeling, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Diffusion, Semiconducting wafers, Projection systems

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Proceedings Article | 2 April 2011 Paper

Evidence of printing blank-related defects on EUV masks missed by blank inspection

Rik Jonckheere, Dieter Van den Heuvel, Tristan Bret, Thorsten Hofmann, John Magana, Israel Aharonson, Doron Meshulach, Eric Hendrickx, Kurt Ronse

Proceedings Volume 7985, 79850W (2011) https://doi.org/10.1117/12.883854

KEYWORDS: Inspection, Printing, Photomasks, Reticles, Wafer inspection, Semiconducting wafers, Extreme ultraviolet, Visualization, Atomic force microscopy, Defect detection

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Proceedings Article | 29 September 2010 Paper

Natural EUV mask blank defects: evidence, timely detection, analysis and outlook

Dieter Van den Heuvel, Rik Jonckheere, John Magana, Tsukasa Abe, Tristan Bret, Eric Hendrickx, Shaunee Cheng, Kurt Ronse

Proceedings Volume 7823, 78231T (2010) https://doi.org/10.1117/12.865812

KEYWORDS: Reticles, Inspection, Printing, Bismuth, Photomasks, Semiconducting wafers, Defect detection, Wafer inspection, Extreme ultraviolet, Atomic force microscopy

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Proceedings Article | 29 September 2010 Paper

EUV mask stack optimization for enhanced imaging performance

Eelco van Setten, Dorothe Oorschot, Cheuk-Wah Man, Mircea Dusa, Robert de Kruif, Natalia Davydova, Kees Feenstra, Christian Wagner, Petra Spies, Nils Wiese, Markus Waiblinger

Proceedings Volume 7823, 78231O (2010) https://doi.org/10.1117/12.864247

KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Reticles, Semiconducting wafers, Reflectivity, Extreme ultraviolet lithography, Optical proximity correction, Scanning electron microscopy, Etching

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Proceedings Article | 2 May 2008 Paper

Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyond

Christian Ehrlich, Ute Buttgereit, Klaus Boehm, Thomas Scheruebl, Klaus Edinger, Tristan Bret

Proceedings Volume 6792, 67920H (2008) https://doi.org/10.1117/12.798599

KEYWORDS: Photomasks, Phase shifts, Imaging systems, Electron beams, Opacity, Sensors, Bridges, Inspection, Visualization, Quartz

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Proceedings Article | 30 October 2007 Paper

Integrated photomask defect printability check, mask repair, and repair validation procedure for phase-shifting masks for the 45-nm node and beyond

Christian Ehrlich, Ute Buttgereit, Klaus Boehm, Thomas Scheruebl, Klaus Edinger, Tristan Bret

Proceedings Volume 6730, 67301Z (2007) https://doi.org/10.1117/12.746666

KEYWORDS: Photomasks, Phase shifts, Electron beams, Imaging systems, Sensors, Phase measurement, Inspection, Opacity, Metrology

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Proceedings Article | 13 September 2005 Paper

Comparison of fabrication methods of sub-100nm nano-optical structures and devices

Patrik Hoffmann, Ivo Utke, Alexandre Perentes, Tristan Bret, Christian Santschi, Vasilis Apostolopoulos

Proceedings Volume 5925, 592506 (2005) https://doi.org/10.1117/12.617142

KEYWORDS: Etching, Electron beam lithography, Metals, Dielectrics, Gold, Photonic crystals, Gallium, Photomasks, Molecules, Electron beams

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Showing 5 of 13 publications

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