Dr. Ute Natura Profile

Dr. Ute Natura

at Hellma Materials GmbH

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Author

Publications (13)

Proceedings Article | 31 December 2009 Paper

Study of haze in 193nm high dose irradiated CaF2 crystals

Ute Natura, Stephan Rix, Martin Letz, Lutz Parthier

Proceedings Volume 7504, 75041P (2009) https://doi.org/10.1117/12.836409

KEYWORDS: Laser scattering, Scattering, Absorption, Refractive index, Annealing, Mie scattering, Air contamination, Crystals, Calcium, Laser crystals

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Proceedings Article | 31 December 2009 Paper

A microscopic model for long-term laser damage in calcium fluoride

Stephan Rix, Ute Natura, Martin Letz, Claudia Felser, Lutz Parthier

Proceedings Volume 7504, 75040J (2009) https://doi.org/10.1117/12.836404

KEYWORDS: Diffusion, Calcium, Ions, Laser induced damage, Crystals, Phonons, Fluorine, Deep ultraviolet, Silver, Laser irradiation

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Proceedings Article | 30 December 2008 Paper

353 nm high fluence irradiation of fused silica

Alfons Burkert, Ute Natura

Proceedings Volume 7132, 71321Q (2008) https://doi.org/10.1117/12.804474

KEYWORDS: Laser induced fluorescence, Silica, Absorption, Luminescence, Fusion energy, Raman spectroscopy, Excimer lasers, Laser irradiation, Laser damage threshold, Laser scattering

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Proceedings Article | 30 December 2008 Paper

Accelerated life time testing of fused silica upon ArF laser irradiation

Ch. Mühlig, W. Triebel, S. Kufert, U. Natura

Proceedings Volume 7132, 71321G (2008) https://doi.org/10.1117/12.804286

KEYWORDS: Absorption, Silica, Temperature metrology, Laser irradiation, Laser induced damage, Hydrogen, Lithography, Deep ultraviolet, Annealing, Excimer lasers

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We report on two approaches to strongly shorten life time testing of fused silica's absoption degradation upon 193 nm laser irradiation. Both approaches are based on enhancing the two photon absorption (TPA) induced generation of E' and NBOH defects centers in fused silica compared to common marathon test irradiation parameters. For the first approach the irradiation fluence is increased from typical values H<1 mJ/cm² to H=10 mJ/cm², therefore increasing the peak laser power for a more efficient TPA process. To avoid microchannel formation in the samples, being a common break-down criterion in marathon tests based on transmission measurements, a small sample of 10 mm length is irradiated and the absorption is measured directly by the laser induced deflection (LID) technique. For comparing the experimental results with a real marathon test at H=1.3 mJ/cm², an experimental grade sample with very low hydrogen content, i.e. fast absorption changes due to reduced defect annealing, is choosen. During the fluence dependent absorption measurements after the prolonged irradiation at H=10 mJ/cm² it is found, that both experiments reveal very comparable absorption data for H=1.3 mJ/cm². For investigating standard material with high hydrogen content, i.e. slow absorption increase due to effective defect annealing, a sample is cooled down to -180 °C in a special designed experimental setup and irradiated at a laser fluence H=10 mJ/cm². To control the increase of the defect density and to determine the end of the TPA induced defect generation, the fluorescence at 650 nm of the generated NBOH centers is monitored. Before and after the low temperature experiment, the absorption coefficient is measured directly by LID technique. By applying both, elevated laser fluence and low temperature, the ArF laser induced generation of E' and NBOH centers in the investigated sample is terminated after about 1.2*10⁷ laser pulses. Therefore, a strong reduction of irradiation time is achieved in comparison to about 10¹⁰ pulses required in common marathon test applications.

Proceedings Article | 20 December 2007 Paper

248 nm high fluence irradiation of CaF2 crystals

Alfons Burkert, Dietmar Keutel, Ute Natura

Proceedings Volume 6720, 67201K (2007) https://doi.org/10.1117/12.752813

KEYWORDS: Laser induced fluorescence, Absorption, Crystals, Excimer lasers, Laser crystals, Laser applications, Luminescence, Polishing, Light scattering, Optical components

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Proceedings Article | 26 March 2007 Paper

Investigations regarding the prevention of depolarization of ArF excimer laser irradiation by CaF₂ laser optics

Ute Natura, Dietmar Keutel, Martin Letz, Lutz Parthier, Konrad Knapp

Proceedings Volume 6520, 652030 (2007) https://doi.org/10.1117/12.712108

KEYWORDS: Polarization, Crystals, Temperature metrology, Laser crystals, Excimer lasers, Laser optics, Birefringence, Calcium, Laser irradiation, Optical properties

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Proceedings Article | 31 August 2005 Paper

Investigating the ArF laser stability of CaF2 at elevated fluences

A. Burkert, Ch. Muehlig, W. Triebel, D. Keutel, U. Natura, L. Parthier, S. Gliech, S. Schroeder, A. Duparre

Proceedings Volume 5878, 58780E (2005) https://doi.org/10.1117/12.616904

KEYWORDS: Absorption, Scattering, Laser induced fluorescence, Laser scattering, Laser irradiation, Laser stabilization, Excimers, Light scattering, Luminescence, Excimer lasers

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Proceedings Article | 12 May 2005 Paper

Kinetics of laser induced changes of characteristic optical properties in Lithosil with 193nm excimer laser exposure

Ute Natura, Rolf Martin, Gordon von der Goenna, Michael Kahlke, Gabriele Fasold

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599319

KEYWORDS: Absorption, Data modeling, Statistical modeling, Excimer lasers, Hydrogen, Silica, Optical properties, Annealing, Optical lithography, Silver

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Proceedings Article | 21 February 2005 Paper

Analysis of laser durability of CaF2 for optical lithography

Guenter Grabosch, Lutz Parthier, Ute Natura, Karin Poehl, Martin Letz, Christian Muehlig, Konrad Knapp

Proceedings Volume 5647, (2005) https://doi.org/10.1117/12.585247

KEYWORDS: Optical lithography, Silver, Lithography, Semiconductors, Semiconductor lasers, Laser applications, Lenses, Immersion lithography, Laser induced damage, Biological research

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Proceedings Article | 10 June 2004 Paper

Mechanisms of radiation-induced defect generation in fused silica

Ute Natura, Oliver Sohr, Rolf Martin, Michael Kahlke, Gabriele Fasold

Proceedings Volume 5273, (2004) https://doi.org/10.1117/12.521739

KEYWORDS: Hydrogen, Absorption, Silica, Refraction, Data modeling, Excimer lasers, Raman spectroscopy, Silicon, Laser irradiation, Refractive index

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Proceedings Article | 28 May 2004 Paper

CaF2 for DUV lens fabrication: basic material properties and dynamic light-matter interaction

Martin Letz, Axel Engel, Wolfgang Mannstadt, Lutz Parthier, Ute Natura, Konrad Knapp

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536666

KEYWORDS: Ions, Crystals, Absorption, Deep ultraviolet, Distortion, Electron holes, Optical properties, Chemical species, Glasses, Temperature metrology

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Proceedings Article | 28 May 2004 Paper

Excimer-laser-induced defect generation in Lithosil

Ute Natura, Oliver Sohr, Martin Letz, Rolf Martin, Michael Kahlke, Gabriele Fasold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.531653

KEYWORDS: Hydrogen, Excimer lasers, Silica, Absorption, Silicon, Data modeling, Statistical modeling, Optical lithography, Raman spectroscopy, Systems modeling

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Proceedings Article | 4 November 2003 Paper

Absorption measurement of DUV optical materials at 193 and 157 nm by laser-induced deflection

Christian Muehlig, Siegfried Kufert, Wolfgang Triebel, Ute Natura, Frank Coriand

Proceedings Volume 5188, (2003) https://doi.org/10.1117/12.506795

KEYWORDS: Absorption, Silica, Laser induced damage, Calcium, Lithography, Excimer lasers, Deep ultraviolet, Laser irradiation, Optical testing, Optical lithography

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Showing 5 of 13 publications

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