Prof. Valeryi A. Sizyuk Profile

Prof. Valeryi A. Sizyuk

Research Associate Professor at Purdue University

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 26 May 2022 Poster + Paper

Integrated simulations of hybrid discharge-laser produced plasma devices for EUV metrology

V. Sizyuk, A. Hassanein, F. Melsheimer, L. Juschkin, T. Sizyuk

Proceedings Volume 12051, 120510R (2022) https://doi.org/10.1117/12.2614327

KEYWORDS: Plasma, Extreme ultraviolet, Xenon, Absorption, Monte Carlo methods, Pulsed laser operation, Gas lasers, Optical simulations, Refraction, Metrology

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Proceedings Article | 19 March 2018 Paper

Increasing EUV source efficiency via recycling of radiation power

Ahmed Hassanein, Valeryi Sizyuk, Tatyana Sizyuk, Kenneth Johnson

Proceedings Volume 10583, 1058319 (2018) https://doi.org/10.1117/12.2297254

KEYWORDS: Extreme ultraviolet, Plasma, Mirrors, Carbon dioxide lasers, Optical design, Monochromators, Diffraction gratings, Reflectors, Optical simulations, Reflectivity

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SPIE Journal Paper | 1 July 2011

Combined effects of prepulsing and target geometry on efficient extreme ultraviolet production from laser produced plasma experiments and modeling

Ahmed Hassanein, Tatyana Sizyuk, Valeryi Sizyuk, Sivanandan Harilal

JM3, Vol. 10, Issue 03, 033002, (July 2011) https://doi.org/10.1117/12.10.1117/1.3609043

KEYWORDS: Plasma, Extreme ultraviolet, Gas lasers, Carbon monoxide, Tin, Laser energy, Absorption, Photon transport, Pulsed laser operation, Nd:YAG lasers

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Proceedings Article | 29 March 2011 Paper

Combined effects of pre-pulsing and target geometry on efficient EUV production from laser produced plasma experiments and modeling

A. Hassanein, T. Sizyuk, V. Sizyuk, S. Harilal

Proceedings Volume 7969, 79690D (2011) https://doi.org/10.1117/12.879517

KEYWORDS: Plasma, Extreme ultraviolet, Carbon dioxide lasers, Tin, Laser energy, Nd:YAG lasers, Extreme ultraviolet lithography, Absorption, Photon transport, Pulsed laser operation

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Proceedings Article | 20 March 2010 Paper

Analysis, simulation, and experimental studies of YAG and CO[sub]2[/sub] laser-produced plasma for EUV lithography sources

A. Hassanein, V. Sizyuk, S. Harilal, T. Sizyuk

Proceedings Volume 7636, 76360A (2010) https://doi.org/10.1117/12.848222

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Nd:YAG lasers, Extreme ultraviolet lithography, Tin, Carbon dioxide, Laser energy, Pulsed laser operation, Absorption

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SPIE Journal Paper | 1 October 2009

Effects of plasma spatial profile on conversion efficiency of laser-produced plasma sources for EUV lithography

Ahmed Hassanein, Valeryi Sizyuk, Tatyana Sizyuk, S. Harilal

JM3, Vol. 8, Issue 04, 041503, (October 2009) https://doi.org/10.1117/12.10.1117/1.3224901

KEYWORDS: Plasma, Extreme ultraviolet, Spherical lenses, Extreme ultraviolet lithography, Performance modeling, Computer simulations, Absorption, Computing systems, Tin, Systems modeling

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Proceedings Article | 24 March 2009 Paper

Effects of plasma spatial profile on conversion efficiency of laser produced plasma sources for EUV lithography

A. Hassanein, V. Sizyuk, T. Sizyuk, S. Harilal

Proceedings Volume 7272, 72720K (2009) https://doi.org/10.1117/12.813423

KEYWORDS: Plasma, Extreme ultraviolet, Performance modeling, Spherical lenses, Extreme ultraviolet lithography, Computer simulations, Absorption, Tin, Laser development, Laser energy

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Proceedings Article | 20 March 2008 Paper

Multidimensional simulation and optimization of hybrid laser and discharge plasma devices for EUV lithography

A. Hassanein, V. Sizyuk, T. Sizyuk

Proceedings Volume 6921, 692113 (2008) https://doi.org/10.1117/12.771218

KEYWORDS: Plasma, Extreme ultraviolet, Magnetism, Photons, Absorption, Monte Carlo methods, Optical simulations, Instrument modeling, 3D modeling, Solids

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SPIE Journal Paper | 1 October 2007

Modeling and optimization of debris mitigation systems for laser and discharge-produced plasma in extreme ultraviolet lithography devices

Valeryi Sizyuk, Ahmed Hassanein, Vivek Bakshi

JM3, Vol. 6, Issue 04, 043003, (October 2007) https://doi.org/10.1117/12.10.1117/1.2804128

KEYWORDS: Ions, Particles, Extreme ultraviolet, Magnetism, Monte Carlo methods, Systems modeling, Plasma, Tin, Argon, Extreme ultraviolet lithography

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Proceedings Article | 21 March 2007 Paper

Optimization of EUV laser and discharge devices for high-volume manufacturing

A. Hassanein, V. Sizyuk, T. Sizyuk, V. Morozov

Proceedings Volume 6517, 65171X (2007) https://doi.org/10.1117/12.712300

KEYWORDS: Ions, Plasma, Particles, Extreme ultraviolet, Magnetism, Monte Carlo methods, Tin, 3D modeling, Extreme ultraviolet lithography, Scattering

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Proceedings Article | 20 May 2004 Paper

Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices

Ahmed Hassanein, Valeryi Sizyuk, Vladimir Tolkach, Vitali Morozov, T. Sizyuk, Bryan Rice, Vivek Bakshi

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534269

KEYWORDS: Plasma, Extreme ultraviolet, Opacity, Magnetism, Monte Carlo methods, Instrument modeling, Absorption, Ions, Integrated modeling, Diffusion

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SPIE Journal Paper | 1 January 2004

HEIGHTS initial simulation of discharge produced plasma hydrodynamics and radiation transport for extreme ultraviolet lithography

Ahmed Hassanein, Valeryi Sizyuk, Vladimir Tolkach, Vitali Morozov, Bryan Rice

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1631445

KEYWORDS: Plasma, Magnetism, Lawrencium, Ionization, Absorption, Data modeling, Chemical species, Integrated modeling, Xenon, Extreme ultraviolet lithography

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Proceedings Article | 16 June 2003 Paper

HEIGHTS initial simulation of discharge-produced plamsa hydrodynamics and radiation transport for EUV lithography

Ahmed Hassanein, Valeryi Sizyuk, Vladimir Tolkach, Vitali Morozov, Bryan Rice

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484929

KEYWORDS: Plasma, Magnetism, Lawrencium, Ionization, Absorption, Chemical species, Integrated modeling, Xenon, Extreme ultraviolet lithography, Diffusion

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Showing 5 of 13 publications

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