Dr. Viviana Agudelo Profile

Dr. Viviana Agudelo

SPIE Involvement:

Author

Area of Expertise:

Optics , Lithography , Computational Optics , Optoelectronics , Diffractive optics , Holography

Publications (6)

Proceedings Article | 15 March 2016 Paper

Firefly: an optical lithographic system for the fabrication of holographic security labels

Jorge Calderón, Oscar Rincón, Ricardo Amézquita, Iván Pulido, Sebastián Amézquita, Andrés Bernal, Luis Romero, Viviana Agudelo

Proceedings Volume 9780, 97800U (2016) https://doi.org/10.1117/12.2218019

KEYWORDS: Holography, Lithography, Optical lithography, Holograms, Optics manufacturing, Imaging systems, Maskless lithography, Digital holography, Electro optical design, Diffractive optical elements, Optical design software, Design for manufacturability, Spatial light modulators, Information security, Photoresist materials, Scanning electron microscopy

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SPIE Journal Paper | 2 December 2013

Application of artificial neural networks to compact mask models in optical lithography simulation

Viviana Agudelo, Tim Fühner, Andreas Erdmann, Peter Evanschitzky

JM3, Vol. 13, Issue 01, 011002, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011002

KEYWORDS: Photomasks, Diffraction, Artificial neural networks, Data modeling, Optical lithography, Systems modeling, Lithography, Polarization, Neurons, Optical simulations

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Proceedings Article | 12 April 2013 Paper

Application of artificial neural networks to compact mask models in optical lithography simulation

Viviana Agudelo, Tim Fühner, Andreas Erdmann, Peter Evanschitzky

Proceedings Volume 8683, 868317 (2013) https://doi.org/10.1117/12.2011132

KEYWORDS: Photomasks, Diffraction, Artificial neural networks, Systems modeling, Optical lithography, Lithography, Performance modeling, Imaging systems, Data modeling, Optical simulations

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Proceedings Article | 13 March 2012 Paper

Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography

Viviana Agudelo, Peter Evanschitzky, Andreas Erdmann, Tim Fühner

Proceedings Volume 8326, 832609 (2012) https://doi.org/10.1117/12.916344

KEYWORDS: Photomasks, Diffraction, Optical filters, 3D modeling, Polarization, Calibration, Solids, Projection systems, Immersion lithography, Lithography

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Proceedings Article | 27 May 2011 Paper

Novel method for automatic filtering in the Fourier space applied to digital hologram reconstruction

O. Rincon, R. Amezquita, Y. Torres, V. Agudelo

Proceedings Volume 8082, 80822E (2011) https://doi.org/10.1117/12.889474

KEYWORDS: Holograms, Digital holography, Optical simulations, Signal to noise ratio, Spatial filters, Diffraction, Digital filtering, Reconstruction algorithms, Optical filters, Fourier transforms

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Proceedings Article | 23 March 2011 Paper

Accuracy and performance of 3D mask models in optical projection lithography

Viviana Agudelo, Peter Evanschitzky, Andreas Erdmann, Tim Fühner, Feng Shao, Steffen Limmer, Dietmar Fey

Proceedings Volume 7973, 79730O (2011) https://doi.org/10.1117/12.879053

KEYWORDS: Photomasks, 3D modeling, Diffraction, Polarization, Systems modeling, Performance modeling, Lithography, Lithographic illumination, Projection lithography, Projection systems

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Showing 5 of 6 publications

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