Some aspects of the expansion of the spectral range for lens objectives for microscope are considered. It is proposed to use two types of optics. The first type provides operation in the near ultraviolet range (NUV) plus a visible range. The second type provides operation in the visible and near infrared (NIR) spectral range.
The optical design as a result of the synthesis of optical elements with known base aberrations properties is the basis for the unification of optical systems of objectives for microscopes. Technical parameters, optical circuits, optical and mechanical structures are subject to unification.
The main difference of the planapochromatic objectives is the extended working spectral range. However, other differences also in achieving increased numerical apertures and an extended linear field. The main challenge is the technical possibility of obtaining rational optical designs.
This paper reviews the technical solutions for reduction optical photolithography systems based on the principle of obtaining a scaled-down object image. Dioptric reduction system design trends are discussed and applied technical solutions for building such systems are proposed. Genuine optical systems are offered which comply with the requirements mentioned above.
The obtaining a compromise aberration correction objectives for visual observation under a biological microscope. Well
know, that objective is the most difficult and expensive element of the microscope optical system. This case, using of
non so many elements objective give the opportunity to reduce the microscope price. But, the technical parameters of
new objectives correspond better results of optical resolution.
The obtaining a large field for visual observation under a polarizing microscope is still a technological challenge. Objective is the most difficult element of the optical system. It should be clear in relation to the chromatic aberration, but also have an increased numerical aperture.
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