A novel high-χ block copolymer polystyrene-b-polycarbonate (PS-b-PC) of the same system with three samples (1, 2, 3) which contain an active -NH- group on the polymer backbone between the PS block and the PC block have been successfully synthesized. It is believed that the hydrogen bond between -NH- and Si-OH (silanol) plays a dominant role which is as a real driving force to promote vertical micro-phase separation under the neutral layer free condition. The periods in which the samples 1, 2 and 3 form a vertical layer micro-phase separation are 10.6, 11.2 and 12.3nm, respectively. Though experiments, the best micro-phase separation process conditions were found (annealing temperature 160-165°C; annealing time 10 min) and the relevant parameters of PS-b-PC are also given. The results show that sample 2 of high-χ (0.19) has better phase separation performance, lower line-edge roughness (LER) and line width roughness (LWR) than the other two samples. These diblock copolymer samples successfully achieved the directed self-assembly (DSA) of PS-b-PC under the condition that the designed silicon substrate groove did not need any neutral layer. Compared with the previously reported methods to orientation control BCPs with χ value and small vertical micro-phase separation while short-term thermal treatment demonstrates PS-b-PC as a rare and valuable candidate for advancing the field of nanolithography. This work will provide extremely important theories, valuable information and insights that apply to nanowire patterning by DSA in state-of-the-art semi-conduction devices.
Block copolymer directed self-assembly (DSA) is a promising technique to print Contact Holes/Vias with polymer blend materials or block copolymers. Polymer blend material is to mix block copolymer and homopolymer. In this paper, the materials we use are polymer blend materials with polystyrene-b-polycarbonate (PS-b-PC) block copolymer and corresponding homopolymer polystyrene. The advantage of polymers is that they do not require complex molecular design and can form cylindrical structures as long as the proportions are right. The polymer can be mixed and used immediately without waiting time. Based on the PS-b-PC which can form a stable lamellar structure, we achieve a controllable cylindrical structure by mixing the two materials and controlling the concentration. After multiple comparison experiments, the phase segregation results of PS-b-PC with PS ratio of 2:1 and 1.5:1 were better, with the diameter about 12.7nm and 14.1nm, and the pitch about 20nm and 22.7nm, respectively.
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