William F. Guthrie
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 9 March 2016
Ronald Dixson, William Guthrie, Richard Allen, Ndubuisi Orji, Michael Cresswell, Christine Murabito
JM3, Vol. 15, Issue 01, 014503, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.014503
KEYWORDS: Etching, Silicon, Calibration, Crystals, Standards development, Scanning electron microscopy, Oxides, Metrology, Wet etching, Photomasks

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 651815 (2007) https://doi.org/10.1117/12.713289
KEYWORDS: Etching, Calibration, Standards development, Scanning electron microscopy, Silicon, Photomasks, Oxides, Metrology, Ultrasonics, Atomic force microscopy

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61520P (2006) https://doi.org/10.1117/12.656803
KEYWORDS: Calibration, Metrology, Standards development, Atomic force microscopy, Dimensional metrology, Atomic force microscope, Prototyping, Error analysis, Crystals, Photomasks

Proceedings Article | 10 May 2005 Paper
Ronald Dixson, Joseph Fu, Ndubuisi Orji, William Guthrie, Richard Allen, Michael Cresswell
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601972
KEYWORDS: Metrology, Calibration, Atomic force microscopy, Standards development, Transmission electron microscopy, Critical dimension metrology, Silicon, Scanning electron microscopy, Semiconductor manufacturing, Crystals

Proceedings Article | 10 May 2005 Paper
M. Cresswell, R. Dixson, W. Guthrie, R. Allen, C. Murabito, B. Park, J. Martinez de Pinillos, A. Hunt
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.606807
KEYWORDS: Atomic force microscopy, Calibration, Critical dimension metrology, Cadmium, Metrology, Semiconducting wafers, Platinum, Silicon, Scanning electron microscopy, Etching

Proceedings Article | 16 July 2002 Paper
Michael Cresswell, E. Hal Bogardus, J.V. Martinez de Pinillos, Marylyn Bennett, Richard Allen, William Guthrie, Christine Murabito, Barbara am Ende, Loren Linholm
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473450
KEYWORDS: Cadmium, Silicon, Semiconducting wafers, Resistance, Oxides, Critical dimension metrology, Optical lithography, Etching, Calibration, Ions

Showing 5 of 6 publications
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