Ms. Yi Huang Profile

Yi Huang

at Semiconductor Manufacturing International Corp

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Author

Publications (4)

Proceedings Article | 19 March 2018 Presentation

Extraction of CDs and side wall angles from top down SEM images of double layered structures (Conference Presentation)

Sergey Babin, Leia Guo, Igor Ivonin, Yi Huang

Proceedings Volume 10585, 105850K (2018) https://doi.org/10.1117/12.2298389

KEYWORDS: Cadmium sulfide, Scanning electron microscopy, Etching, Transmission electron microscopy, Metrology, Semiconductor manufacturing, Critical dimension metrology, Image processing, Software development

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Proceedings Article | 21 March 2017 Paper

The line roughness improvement with plasma coating and cure treatment for 193nm lithography and beyond

Erhu Zheng, Yi Huang, Haiyang Zhang

Proceedings Volume 10149, 101490Y (2017) https://doi.org/10.1117/12.2257395

KEYWORDS: Plasma, Coating, Line edge roughness, Line width roughness, 193nm lithography, Optical lithography, Plasma etching, Etching, Process modeling, Plasma treatment, Vacuum ultraviolet, Argon

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Proceedings Article | 10 April 2013 Paper

Quantitative CD-SEM resist shrinkage study and its application for accurate CD-SEM tools' matching

Wen Hui Li, Yi Shih Lin, Siyuan Frank Yang, Bo Xiu Cai, Yi Huang

Proceedings Volume 8681, 868128 (2013) https://doi.org/10.1117/12.2011244

KEYWORDS: Data modeling, Critical dimension metrology, Semiconducting wafers, Metrology, Error analysis, Americium, Process control, Statistical analysis, Manufacturing, Signal detection

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Proceedings Article | 10 April 2013 Paper

Characterization of a 'first measurement effect' in CD-SEM measurement

Boxiu Cai, Yi-Shih Lin, Qiang Wu, Yi Huang, Siyuan Yang, Wen-Hui Li, Michael Hao

Proceedings Volume 8681, 868131 (2013) https://doi.org/10.1117/12.2010942

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Metrology, Line edge roughness, Physics, Time metrology, Semiconducting wafers, Control systems, Semiconductors, Image acquisition

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