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Yanjie Mao
at Shanghai Institute of Optics and Fine Mechanics
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Author
Publications (4)
SPIE Journal Paper | 24 January 2019
Predictor of thermal aberrations via particle filter for online compensation
JM3, Vol. 18, Issue 01, 013502, (January 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013502
KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration
SPIE Journal Paper | 11 April 2018
Modeling and optimization of lens heating effect for lithographic projector
JM3, Vol. 17, Issue 02, 023501, (April 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023501
KEYWORDS: Projection systems, Lithography, Optical components, Optimization (mathematics), Thermal modeling, Refractive index, Photomasks, Optical design, Lithographic illumination, Thermography
Proceedings Article | 20 March 2018 Paper
Prediction of lens heating induced aberration via particle filter in optical lithography
Proceedings Volume 10587, 105871K (2018) https://doi.org/10.1117/12.2297338
KEYWORDS: Particle filters, Semiconducting wafers, Lithography, Thermal modeling, Projection systems, Data modeling, Optical lithography, Manufacturing
Proceedings Article | 24 March 2017 Paper
The thermal aberration analysis of a lithography projection lens
Proceedings Volume 10147, 101471P (2017) https://doi.org/10.1117/12.2258037
KEYWORDS: Lens design, Thermal modeling, Lithography, Optical lithography, Refractive index, Optical design, Thermal analysis, Wavefront aberrations, Optical components, Silica, Photomasks
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