The 3wt% aluminum-doped zinc oxide film (AZO) was sputtered on glass by radio frequency (RF)
magnetron sputtering using ceramic target. What's more, sputtering was carried out at different
substrate temperatures from 200°C to 350°C with normal deposition. The effect of deposition
temperature on structural, optical and electrical properties of the AZO films was studied. It was found
that the films become more uniform and compactness as the deposition temperature increased from
200°C to 300°C. Highly oriented AZO films in the (002) direction were observed in specimens
deposited at 250°C and 300°C. In addition, It was showed that the average optical transmittance of
specimens was about 85%. And there was an increase in electrical conductivity when deposition
temperature increased from 200°C to 300°C. The lowest resistivity of 1.05×10-3Ω•cm was obtained in
specimen deposited at 300°C, which makes them available as transparent conductive electrodes in
photonics devices including LCD flat panel displays and solar cells.
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