Mr. Yosuke Kojima Profile

Yosuke Kojima

Vice President at Toppan Photomask Co Ltd

SPIE Involvement:

Author | Editor

Publications (27)

Proceedings Article | 12 November 2024 Presentation + Paper

Development of advanced EUV mask absorbers with various properties

Daisuke Miyawaki, Daisuke Sakurai, Yu Hasegawa, Hideaki Nakano, Itaru Yoshida, Kazunori Seki, Yosuke Kojima

Proceedings Volume 13215, 132150F (2024) https://doi.org/10.1117/12.3033972

KEYWORDS: Extreme ultraviolet, Tantalum, Semiconducting wafers, Lithography, Simulations, Mask making, Film thickness, Reflectivity, Optical properties

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Proceedings Article | 26 August 2024 Paper

Evaluation and countermeasures verification of haze on ArF PSM

Kyoko Kuroki, Kazuaki Matsui, Yosuke Kojima

Proceedings Volume 13177, 131770I (2024) https://doi.org/10.1117/12.3034876

KEYWORDS: Photomasks, Molybdenum, Phase shifts, Lithography

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Proceedings Article | 21 November 2023 Poster + Paper

Mask optimization approach for wafer LCDU improvement in ArF lithography

Kenjiro Ichikawa, Itaru Yoshida, Kazuaki Matsui, Yosuke Kojima, Tatsuya Nagatomo, Mitsuharu Yamana

Proceedings Volume 12751, 127511H (2023) https://doi.org/10.1117/12.2688551

KEYWORDS: Semiconducting wafers, Lithography, Error analysis, Printing, Transmittance, Source mask optimization, Wafer testing, Optical proximity correction, Optical lithography, Photomasks

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Proceedings Article | 16 September 2022 Paper

Resist pattern resolution on hard mask layer for photomask

Naoto Yonemaru, Kazuaki Matsui, Itaru Yoshida, Yosuke Kojima, Mitsuharu Yamana

Proceedings Volume 12325, 123250D (2022) https://doi.org/10.1117/12.2640377

KEYWORDS: Etching, Photomasks, Tantalum, Silicon

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Proceedings Article | 23 August 2021 Paper

Study of high-transmission PSM for lithographic performance and defect control

Kazuaki Matsui, Naoto Yonemaru, Yosuke Kojima, Tatsuya Nagatomo, Mitsuharu Yamana

Proceedings Volume 11908, 119080A (2021) https://doi.org/10.1117/12.2601771

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, SRAF, Scanning electron microscopy, Optical proximity correction, Logic, Critical dimension metrology, Wafer testing, Nanoimprint lithography

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SPIE Journal Paper | 22 March 2021

Effects of mask pattern transmission on ArF lithographic performance in contact hole patterning

Naoto Yonemaru, Kazuaki Matsui, Yosuke Kojima, Tatsuya Nagatomo, Mitsuharu Yamana

JM3, Vol. 20, Issue 01, 014401, (March 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.014401

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Nanoimprint lithography, Scanning electron microscopy, SRAF, Optical proximity correction, Optical lithography, Wafer testing, Etching

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Proceedings Article | 12 October 2020 Presentation + Paper

A novel "high-transmission" phase shift mask for ArF lithographic performance enhancement

Naoto Yonemaru, Kazuaki Matsui, Yosuke Kojima, Tatsuya Nagatomo, Mitsuharu Yamana

Proceedings Volume 11518, 115180B (2020) https://doi.org/10.1117/12.2572021

KEYWORDS: Photomasks, Lithography, 193nm lithography, Phase shifts, Semiconducting wafers, Nanoimprint lithography, Image enhancement, Critical dimension metrology, Mask making, Dry etching

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Proceedings Article | 8 November 2012 Paper

Impact of mask CDU and local CD variation on intra-field CDU

Junji Miyazaki, Orion Mouraille, Jo Finders, Masaru Higuchi, Yosuke Kojima, Shunsuke Sato, Hiroaki Morimoto

Proceedings Volume 8522, 85220E (2012) https://doi.org/10.1117/12.970523

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Lithography, Photoresist processing, Reticles, Metrology, Radium, Semiconductors

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Proceedings Article | 17 April 2012 Paper

PSM and thin OMOG reticles aerial imaging metrology comparison study

Yaron Cohen, Jo Finders, Shmoolik Mangan, Ilan Englard, Orion Mouraille, Maurice Janssen, Junji Miyazaki, Brid Connolly, Yosuke Kojima, Masaru Higuchi

Proceedings Volume 8352, 83520H (2012) https://doi.org/10.1117/12.919791

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Scanners, Reticles, Critical dimension metrology, Airborne remote sensing, Optical proximity correction, Phase shifts, Integrated circuit design

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Proceedings Article | 16 April 2012 Paper

Impact of reticle absorber on the imaging properties in ArFi lithography

Jo Finders, O. Mouraille, A. Bouma, A. Ngai, K. Grim, J. van Praagh, C. Toma, J. Miyazaki, M. Higuchi, Y. Kojima, B. Connolly, I. Englard, Y. Cohen, S. Mangan, Michael Ben Yishai, Karine Jullian

Proceedings Volume 8352, 83520G (2012) https://doi.org/10.1117/12.918018

KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, Lithography, Metrology, Scatterometry, Immersion lithography, Logic

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Proceedings Article | 4 April 2012 Paper

ArFi lithogrphy optimization for thin OMOG reticle with fast aerial imaging

Yaron Cohen, Jo Finders, Shmoolik Mangan, Ilan Englard, Orion Mouraille, Maurice Janssen, Junji Miyazaki, Brid Connolly, Yosuke Kojima, Masaru Higuchi

Proceedings Volume 8324, 83240B (2012) https://doi.org/10.1117/12.918049

KEYWORDS: Photomasks, Semiconducting wafers, Scanners, Reticles, Critical dimension metrology, Lithography, Metrology, Calibration, Airborne remote sensing, 3D metrology

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Proceedings Article | 14 October 2011 Paper

Attenuated phase-shift mask with high tolerance for 193nm radiation damage

Taichi Yamazaki, Ryohei Gorai, Yosuke Kojima, Takashi Haraguchi, Tsuyoshi Tanaka, Ryuji Koitabashi, Yukio Inazuki, Hiroki Yoshikawa

Proceedings Volume 8166, 81663V (2011) https://doi.org/10.1117/12.898984

KEYWORDS: Photomasks, Silica, Lithography, Opacity, Excimer lasers, Phase shifts, Critical dimension metrology, Chemical vapor deposition, Radiation effects, 193nm lithography

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Proceedings Article | 25 September 2010 Paper

Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask

Yoshifumi Sakamoto, Tomohito Hirose, Hitomi Tsukuda, Taichi Yamazaki, Yosuke Kojima, Hayato Ida, Takashi Haraguchi, Tsuyoshi Tanaka, Ryuji Koitabashi, Yukio Inazuki, Hiroki Yoshikawa

Proceedings Volume 7823, 782324 (2010) https://doi.org/10.1117/12.867710

KEYWORDS: Photomasks, Opacity, Lithography, Radiation effects, Silica, Transmission electron microscopy, Excimer lasers, 193nm lithography, Silicon, Oxidation

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Proceedings Article | 26 May 2010 Paper

Study of etching process for LER and resolution

Tomohiro Imoto, Yosuke Kojima, Norihito Fukugami, Takashi Haraguchi, Tsuyoshi Tanaka

Proceedings Volume 7748, 77480D (2010) https://doi.org/10.1117/12.866417

KEYWORDS: Line edge roughness, Etching, Photomasks, Chromium, Opacity, Semiconducting wafers, Inspection, Printing, Dry etching, Scanning electron microscopy

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Proceedings Article | 11 May 2009 Paper

Fine pattern fabrication property of binary mask and attenuated phase shift mask

Taichi Yamazaki, Yosuke Kojima, Mitsuharu Yamana, Takashi Haraguchi, Tsuyoshi Tanaka

Proceedings Volume 7379, 73791V (2009) https://doi.org/10.1117/12.824307

KEYWORDS: SRAF, Chromium, Photomasks, Inspection, Image resolution, Phase shifts, Optical simulations, Binary data, Semiconducting wafers, Glasses

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Proceedings Article | 11 May 2009 Paper

An evaluation of a new side-wall-angle measurement technique for mask patterns by CD-SEM

Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yosuke Kojima, Yoshifumi Sakamoto, Keishi Tanaka

Proceedings Volume 7379, 737922 (2009) https://doi.org/10.1117/12.824280

KEYWORDS: Photomasks, Extreme ultraviolet, Scanning electron microscopy, Metrology, Pixel resolution, Time metrology, 3D metrology, Scatterometry, Electron beams, Reflectivity

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Proceedings Article | 17 October 2008 Paper

Challenges for the quality control of assist features for 45nm node technology and beyond

Lin Wang, Todd Lukanc, Makoto Takahashi, Hung-Eil Kim, Khoi Phan, Taichi Yamazaki, Yosuke Kojima, Wataru Nozaki, Takashi Haraguchi, Yoshimitsu Okuda

Proceedings Volume 7122, 71220Z (2008) https://doi.org/10.1117/12.800916

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Optical proximity correction, Line edge roughness, Chromium, Photoresist processing, Resolution enhancement technologies, Reticles, SRAF

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Proceedings Article | 19 May 2008 Paper

MoSi absorber photomask for 32nm node

Toshio Konishi, Yosuke Kojima, Hiroyuki Takahashi, Masato Tanabe, Takashi Haraguchi, Matthew Lamantia, Yuichi Fukushima, Yoshimitsu Okuda

Proceedings Volume 7028, 702803 (2008) https://doi.org/10.1117/12.796010

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Air contamination, Lithography, Nanoimprint lithography, Printing, Critical dimension metrology, Binary data, Dry etching

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Proceedings Article | 11 May 2007 Paper

Improvement of CD variation control for attenuated phase-shift mask

Mikio Takagi, Takashi Mizoguchi, Yosuke Kojima, Tadashi Saga, Takashi Haraguchi, Yuichi Fukushima, Tsuyoshi Tanaka, Yoshimitsu Okuda, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki

Proceedings Volume 6607, 66070B (2007) https://doi.org/10.1117/12.728924

KEYWORDS: Chromium, Critical dimension metrology, Photomasks, Etching, Printing, Semiconducting wafers, Manufacturing, Mass attenuation coefficient, Metals, Molybdenum

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Proceedings Article | 11 May 2007 Paper

Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, Ken Ozawa

Proceedings Volume 6607, 66070C (2007) https://doi.org/10.1117/12.728925

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Printing, Etching, Binary data, Resolution enhancement technologies, Reflectivity, Scanning electron microscopy, Image enhancement

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Proceedings Article | 20 October 2006 Paper

High-transmission attenuated phase-shift mask for ArF immersion lithography

Yosuke Kojima, Takashi Mizoguchi, Takashi Haraguchi, Toshio Konishi, Yoshimitsu Okuda

Proceedings Volume 6349, 63491V (2006) https://doi.org/10.1117/12.686998

KEYWORDS: Optical proximity correction, Transmittance, Photomasks, Polarization, Scanners, Resolution enhancement technologies, Lithography, Immersion lithography, Phase shifting, Semiconducting wafers

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Proceedings Article | 21 June 2006 Paper

Through-pitch and through-focus characterization of AAPSM for ArF immersion lithography

Toshio Konishi, Yosuke Kojima, Yoshimitsu Okuda, Vicky Philipsen, Leonardus Leunissen, Lieve Van Look

Proceedings Volume 6281, 62810S (2006) https://doi.org/10.1117/12.692802

KEYWORDS: Photomasks, Semiconducting wafers, Etching, Printing, Quartz, Immersion lithography, Chromium, Scanners, Lithography, Image enhancement

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Proceedings Article | 19 May 2006 Paper

Study of mask induced polarization effects on att.PSM in immersion lithography

Takashi Mizoguchi, Yousuke Kojima, Mikio Takagi, Tadashi Saga, Takashi Haraguchi, Toshio Konishi, Yuuichi Fukushima, Tsuyoshi Tanaka, Yoshimitsu Okuda

Proceedings Volume 6283, 62831E (2006) https://doi.org/10.1117/12.681878

KEYWORDS: Nanoimprint lithography, Photomasks, Polarization, Refractive index, Immersion lithography, Mass attenuation coefficient, Lithographic illumination, Lithography, Quartz, Printing

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Proceedings Article | 15 March 2006 Paper

Performance study of chromeless phase lithography mask for the 65nm node and beyond

Yosuke Kojima, Takashi Ohshima, Kazuaki Chiba, Toshio Konishi

Proceedings Volume 6154, 615428 (2006) https://doi.org/10.1117/12.656915

KEYWORDS: Nanoimprint lithography, Scattering, Phase shifts, Lithography, Photomasks, Resolution enhancement technologies, 193nm lithography, 3D image enhancement, Quartz, Electroluminescence

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Proceedings Article | 28 June 2005 Paper

Evaluation of quartz dry etching profile for the PSM lithography performance

Toru Komizo, Satoru Nemoto, Yosuke Kojima, Takashi Ohshima, Takashi Yoshii, Toshio Konishi, Kazuaki Chiba, Yasutaka Kikuchi, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617440

KEYWORDS: Quartz, Photomasks, Lithography, Etching, Semiconducting wafers, Dry etching, Phase shifts, Chromium, Scanning electron microscopy, Electromagnetism

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Proceedings Article | 20 August 2004 Paper

Study of alternating phase shift mask structures for ArF lithography

Yosuke Kojima, Toshio Konishi, Jun Sasaki, Keishi Tanaka, Toru Komizo, Motohiko Morita, Masanori Shirasaki, Takashi Ohshima, Hiroyuki Takahashi, Kazuaki Chiba, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557801

KEYWORDS: Photomasks, Semiconducting wafers, Chromium, Phase shifts, Lithography, Nanoimprint lithography, Printing, Logic devices, Light scattering, Semiconductors

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Proceedings Article | 17 December 2003 Paper

Study of alternating phase-shift mask structure for 65-nm node devices

Toshio Konishi, Tooru Komizo, Hiroyuki Takahashi, Motohiko Morita, Takashi Ohshima, Kazuaki Chiba, Yosuke Kojima, Jun Sasaki, Keishi Tanaka, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.522180

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Reticles, Phase shifts, 193nm lithography, Mask making, Semiconductors, Analytical research, Printing

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