Mr. Yuan-Hsun Wu Profile

Yuan-Hsun Wu

Global Product Manager at Merck

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Publications (3)

Proceedings Article | 28 June 2005 Paper

Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process

Yu Chang, Yuan-Hsun Wu, Chiang-Lin Shih, Jengping Lin, Francis Kan, Jimmy Lin

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617212

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Lithography, Manufacturing, Error analysis, Image quality, Process control, Scanners, Wafer-level optics

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Proceedings Article | 28 June 2005 Paper

Application of CPL mask for whole chip 65nm DRAM patterning

Orson Lin, Richard Hung, Booky Lee, Yuan-Hsun Wu, Makoto Kozuma, Chiang-Lin Shih, Jengping Lin, Michael Hsu, Stephen Hsu

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617230

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Manufacturing, Resolution enhancement technologies, Etching, Data modeling, Quartz, Chromium, Coating

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Proceedings Article | 27 January 2005 Paper

Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology

Booky Lee, Richard Hung, Orson Lin, Yuan-Hsun Wu, Makoto Kozuma, Chiang-Lin Shih, Michael Hsu, Stephen Hsu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576542

KEYWORDS: Photomasks, Etching, Neodymium, Coating, Quartz, Chromium, Optical alignment, Scanning electron microscopy, Contamination, Image processing

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