Dr. Yulia Korobko Profile

Dr. Yulia Korobko

Sr. Litho Engineer (e-Beam) at IMO

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Publications (11)

Proceedings Article | 23 March 2020 Paper

Development and deployment of advanced multi-beam mask writer

Mahesh Chandramouli, Bin Liu, Reid Juday, Bassam Shamoun, Yulia Korobko, Andrew Sowers, Yoshihiro Tezuka, Frank Abboud

Proceedings Volume 11324, 113240K (2020) https://doi.org/10.1117/12.2556552

KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Lithography, Electrodes, Overlay metrology, Optical lithography, Manufacturing, Printing, Extreme ultraviolet

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Proceedings Article | 14 May 2007 Paper

SEM-based system for photomask placement metrology

Max Lau, Yulia Korobko

Proceedings Volume 6607, 660727 (2007) https://doi.org/10.1117/12.728990

KEYWORDS: Optical proximity correction, Metrology, Scanning electron microscopy, Image registration, Photomasks, Reticles, Image processing, Overlay metrology, Critical dimension metrology, Distortion

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Proceedings Article | 5 November 2005 Paper

Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask

Jian Ma, Ke Han, Kyung Lee, Yulia Korobko, Mary Silva, Joas Chavez, Brian Irvine, Sven Henrichs, Kishore Chakravorty, Robert Olshausen, Mahesh Chandramouli, Bobby Mammen, Ramaswamy Padmanaban

Proceedings Volume 5992, 59921P (2005) https://doi.org/10.1117/12.632160

KEYWORDS: Overlay metrology, Neodymium, Quartz, Chromium, Photomasks, Tolerancing, Phase shifts, Etching, Scanning electron microscopy, Optical testing

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Proceedings Article | 28 June 2005 Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359

KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

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Proceedings Article | 6 December 2004 Paper

Calibration of the registration metrology systems

Mahesh Chandramouli, Yulia Korobko

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568245

KEYWORDS: Calibration, Metrology, Photomasks, Mirrors, Interferometers, Manufacturing, Reticles, Error analysis, Lithography, Imaging systems

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Proceedings Article | 31 July 2003 Paper

Adaptive electrorheological layer for precision control of thin-wall constructions

Evguenia Korobko, Valentin Kolik, Yulia Korobko

Proceedings Volume 5052, (2003) https://doi.org/10.1117/12.483972

KEYWORDS: Electrodes, Magnetism, Dielectrics, Solids, Surface finishing, Reliability, Particles, Semiconductors, Mathematical modeling, Epoxies

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Proceedings Article | 26 June 2003 Paper

Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks

Eric Cotte, Roxann Engelstad, Edward Lovell, Daniel Tanzil, Florence Eschbach, Yulia Korobko, Minoru Fujita, Hiroaki Nakagawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485474

KEYWORDS: Reticles, Pellicles, Adhesives, Metrology, Sensors, Aluminum, Photomasks, Lithography, Photography, Mechanics

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Proceedings Article | 2 July 2001 Paper

Electrorheological vibration system

Evguenia Korobko, Zinovy Shulman, Yulia Korobko

Proceedings Volume 4331, (2001) https://doi.org/10.1117/12.432721

KEYWORDS: Chemical elements, Electrodes, Phase shifts, Relays, Modulation, Oscillators, Signal generators, Amplifiers, Control systems

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Proceedings Article | 22 January 2001 Paper

Technological challenges in implementation of alternating phase-shift mask

Wilman Tsai, Qi-De Qian, Ken Buckmann, Wen-Hao Cheng, Long He, Brian Irvine, Marilyn Kamna, Yulia Korobko, Michael Kovalchick, Steven Labovitz, R. Talevi, Jeff Farnsworth

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410720

KEYWORDS: Etching, Photomasks, Inspection, Image processing, Critical dimension metrology, Optical lithography, Semiconducting wafers, Plasma etching, Phase shifts, Isotropic etching

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Proceedings Article | 27 April 2000 Paper

Thermophysical properties and rheological behavior of electro-rheological fluids at different temperatures

Evguenia Korobko, Yulia Korobko

Proceedings Volume 3989, (2000) https://doi.org/10.1117/12.384593

KEYWORDS: Particles, Convection, Transformers, Thermal effects, Solids, Electrodes, Temperature metrology, Copper, Dielectrics, Nickel

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Proceedings Article | 18 December 1998 Paper

Resolution limits with 248-nm strong phase-shifting techniques for contact patterning applications

Yulia Korobko, Mei-Chien Lu, Jesmar Telans, Jeffrey Powers

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332858

KEYWORDS: Phase shifts, Photomasks, Lithography, Semiconducting wafers, Optical lithography, Critical dimension metrology, Resolution enhancement technologies, Modulation transfer functions, Reticles, Phase shift keying

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Showing 5 of 11 publications

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