CONFERENCE PROCEEDINGS
Advanced Search
Yuna Park
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 22 February 2021 Presentation + Paper
Edge placement error wafer mapping and investigation for improvement in advanced DRAM node
Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park, Jonggeun Won, Nang-Lyeom Oh, Hsin-Yu Chen, WeiTai Lin, Chih-Hung Hsieh, Kuo-Feng Pao, Kyoyeon Cho, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Taekwon Jee, Seung-Uk Jeong, Jeongwoo Jae, Sang-Woo Kim, Dongyoung Lee, Jungchan Kim, WonKwang Ma, Sang-Ho Lee, Chan-Ha Park
Proceedings Volume 11611, 116111V (2021) https://doi.org/10.1117/12.2584149
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Optical lithography, Metrology, Visualization, Statistical analysis, Lithography, Graphic design, Etching
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top