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Microchannels with rectangular and arched core shapes fabricated using sacrificial etching

[+] Author Affiliations
Jeffrey R. Lee

Brigham Young University, Department of Chemistry and Biochemistry, C100 Benson Building, Provo, Utah 84602

John P. Barber

Brigham Young University, Department of Electrical and Computer Engineering, 459 Clyde Building, Provo, Utah 84602

Zachary A. George

Brigham Young University, Department of Electrical and Computer Engineering, 459 Clyde Building, Provo, Utah 84602

Milton L. Lee

Brigham Young University, Department of Chemistry and Biochemistry, C100 Benson Building, Provo, Utah 84602

Holger Schmidt

University of California–Santa Cruz, School of Engineering, 1156 High Street, Santa Cruz, California 95064

Aaron R. Hawkins

Brigham Young University, Department of Electrical and Computer Engineering, 459 Clyde Building, Provo, Utah 84602

J. Micro/Nanolith. MEMS MOEMS. 6(1), 013010 (January 25, 2007). doi:10.1117/1.2434990
History: Received August 17, 2005; Revised May 11, 2006; Accepted September 22, 2006; Published January 25, 2007
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A study of relevant fabrication parameters is presented for a process that uses chemical etching of sacrificial cores to produce long, hollow microchannels. Two different sacrificial materials are investigated, SU8 and reflowed photoresist. These two materials produce channel cross sections with rectangular and arch-shaped cores, respectively. Fabrication times based on etch removal rates of sacrificial materials are reported for SU8 core microchannels and for a hybrid core consisting of reflowed photoresist and aluminum layers. The hybrid design takes advantage of the fast etch times possible for aluminum, but also produces smooth, arched sidewalls. Structural integrity is also investigated for different microchannels, specifically the wall thickness required to produce an intact channel of a given width. Empirical design rules indicate that SU8-based core channels require a wall thickness-to-width ratio of greater than 1:10, and reflowed photoresist based structures require a ratio greater than 1:50.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Jeffrey R. Lee ; John P. Barber ; Zachary A. George ; Milton L. Lee ; Holger Schmidt, et al.
"Microchannels with rectangular and arched core shapes fabricated using sacrificial etching", J. Micro/Nanolith. MEMS MOEMS. 6(1), 013010 (January 25, 2007). ; http://dx.doi.org/10.1117/1.2434990


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