Benchmark study of run-to-run controllers for the lithographic control of the critical dimension

Ziqiang John Mao; Wei Kang

doi:10.1117/1.2743657

1 April 2007 Benchmark study of run-to-run controllers for the lithographic control of the critical dimension

Ziqiang John Mao, Wei Kang

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 6, Issue 2, 023001 (April 2007). https://doi.org/10.1117/1.2743657

Abstract

We present a systematic robustness analysis for several feedback controllers used in photolithographic critical dimension (CD) control in semiconductor manufacturing. Our study includes several controllers based on either the exponentially weighted moving average (EWMA) estimation or Kalman filters. The robustness is characterized by two features, namely the controller's stability margin in the presence of model mismatch and the controller's sensitivity to unknown noise. Simulations on the closed-loop control system are shown for the performance comparison. Both the analysis and the simulations prove that the multiple-dimensional feedback controller developed in this paper using the average of previous inputs and outputs outperforms the other controllers in the group.

©(2007) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Ziqiang John Mao and Wei Kang "Benchmark study of run-to-run controllers for the lithographic control of the critical dimension," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(2), 023001 (1 April 2007). https://doi.org/10.1117/1.2743657

Published: 1 April 2007

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