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Benchmark study of run-to-run controllers for the lithographic control of the critical dimension

[+] Author Affiliations
Ziqiang (John) Mao

Intel Corporation, RNB-3-11, 2200 Mission College Boulevard, Santa Clara, California 95120

Wei Kang

Naval Postgraduate School, Department of Applied Mathematics, Monterey, California 93943

J. Micro/Nanolith. MEMS MOEMS. 6(2), 023001 (June 05, 2007). doi:10.1117/1.2743657
History: Received April 10, 2006; Revised February 22, 2007; Accepted March 02, 2007; Published June 05, 2007
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We present a systematic robustness analysis for several feedback controllers used in photolithographic critical dimension (CD) control in semiconductor manufacturing. Our study includes several controllers based on either the exponentially weighted moving average (EWMA) estimation or Kalman filters. The robustness is characterized by two features, namely the controller’s stability margin in the presence of model mismatch and the controller’s sensitivity to unknown noise. Simulations on the closed-loop control system are shown for the performance comparison. Both the analysis and the simulations prove that the multiple-dimensional feedback controller developed in this paper using the average of previous inputs and outputs outperforms the other controllers in the group.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Ziqiang (John) Mao and Wei Kang
"Benchmark study of run-to-run controllers for the lithographic control of the critical dimension", J. Micro/Nanolith. MEMS MOEMS. 6(2), 023001 (June 05, 2007). ; http://dx.doi.org/10.1117/1.2743657


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