MASKLESS LITHOGRAPHY

High-resolution maskless lithography

[+] Author Affiliations
Kin Foong Chan, Zhiqiang Feng, Ren Yang, Akihito Ishikawa, Wenhui Mei

Ball Semiconductor, Incorporated, 415 Century Parkway, Allen, Texas?75013-8043

J. Micro/Nanolith. MEMS MOEMS. 2(4), 331-339 (Oct 01, 2003). doi:10.1117/1.1611182
History: Received Dec. 11, 2002; Revised Feb. 25, 2003; Revised May 27, 2003; Revised May 8, 2003; Accepted Jun. 13, 2003; Online October 03, 2003
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An innovative high-resolution maskless lithography system is designed employing a combination of low- and high-numerical-aperture (NA) projection lens systems along with integrated micro-optics, and using Texas Instruments’ super video graphic array (SVGA) digital micromirror device (DMD) as the spatial and temporal light modulator. A mercury arc lamp filtered for the G-line (λ=435.8nm) is used as the light source. Exposure experiments are performed using data extraction and transfer software, and synchronous stage control algorithms derived from a point array scrolling technique. Each exposure scan produces a field width (W) of approximately 8.47 mm with a field length (longitudinal field) limited only by onboard memory capacity. DMD frame rates of up to 5 kHz (kframes/s), synchronized to the stage motion, are achievable. In this experiment, TSMR-8970XB10 photoresist (PR), diluted to 3.8 cP with PR thinner is prepared. The PR is spin-coated onto a chrome-coated glass substrate to 1.0-μm thickness with 0.1-μm uniformity. A 0.4-μm scan step is used and 27,000 DMD data frames are extracted and transferred to the DMD driver. Results indicate consistent 1.8-μm line space (L/S) resolved across the entire field width of 8.47 mm. Given optimized exposure and development conditions, 1.5-μm L/S is also observed at certain locations. The potential of this maskless lithography system is substantial; its performance is sufficient for applications in microelectromechanical systems (MEMS), photomasking, high-resolution LCD, high-density printed circuit boards (PCBs), etc. Higher productivity is predicted by a custom H-line (λ=405nm) lens system designed and used in conjunction with a violet diode laser systems and the development of a real-time driver. © 2003 Society of Photo-Optical Instrumentation Engineers.

© 2003 Society of Photo-Optical Instrumentation Engineers

Citation

Kin Foong Chan ; Zhiqiang Feng ; Ren Yang ; Akihito Ishikawa and Wenhui Mei
"High-resolution maskless lithography", J. Micro/Nanolith. MEMS MOEMS. 2(4), 331-339 (Oct 01, 2003). ; http://dx.doi.org/10.1117/1.1611182


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