Extreme Ultraviolet Lithography

Optimization of multilayer reflectors for extreme ultraviolet lithography

[+] Author Affiliations
Matthieu F. Bal, Mandeep Singh, Joseph J. M. Braat

Delft University of Technology, Optics Research Group, Faculty of Applied Sciences, Lorentzweg 1, 2628 CJ Delft, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 3(4), 537-544 (Oct 01, 2004). doi:10.1117/1.1793171
History: Received Oct. 16, 2003; Revised Mar. 30, 2004; Accepted May 19, 2004; Online October 08, 2004
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Multilayer interference coatings on reflective elements in extreme ultraviolet (EUV) projection lithography systems introduce phase and amplitude variations at reflection, which have important implications for imaging properties, e.g., resolution, depth of focus, and tolerances. We discuss the numerical results of the optical effects of multilayers (MLs) and the inclusion of these effects in optical design. This numerical study demonstrates the advantages of spatially varying (graded) MLs compared to multilayers with constant layer thicknesses. We present a new method to calculate the optimum grading of multilayers. Using this new method, we are able to fully optimize the wavefronts emerging from the projection system toward the image plane. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Matthieu F. Bal ; Mandeep Singh and Joseph J. M. Braat
"Optimization of multilayer reflectors for extreme ultraviolet lithography", J. Micro/Nanolith. MEMS MOEMS. 3(4), 537-544 (Oct 01, 2004). ; http://dx.doi.org/10.1117/1.1793171


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