Fabrication by Electron Beams

Continuous-tone grayscale mask fabrication using high-energy-beam-sensitive glass

[+] Author Affiliations
Thomas Dillon, Anita Sure, Janusz Murakowski, Dennis Prather

University of Delaware, Department of Electrical and Computer Engineering, 140 Evans Hall, Newark, Delaware?19716 E-mail: dillon@ee.udel.edu

J. Micro/Nanolith. MEMS MOEMS. 3(4), 550-554 (Oct 01, 2004). doi:10.1117/1.1793156
History: Received Sep. 30, 2002; Revised Mar. 8, 2004; Accepted May 4, 2004; Online October 08, 2004
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For highest efficiency optical devices, it is desirable to form continuously graded device features. We describe a technique to produce such features through the fabrication of a continuous-tone grayscale mask and subsequent grayscale photolithography. The design of the mask fabrication process is outlined, including the high-energy-beam-sensitive (HEBS) glass electron-beam exposure response characterization, and the generation of an exposure profile with inherent proximity effect correction. Application of the process is demonstrated through fabrication of smooth-facet retroreflectors, with features that are not possible to produce either by a grayscale process that employs discreet gray levels or by anisotropic wet etch techniques. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Thomas Dillon ; Anita Sure ; Janusz Murakowski and Dennis Prather
"Continuous-tone grayscale mask fabrication using high-energy-beam-sensitive glass", J. Micro/Nanolith. MEMS MOEMS. 3(4), 550-554 (Oct 01, 2004). ; http://dx.doi.org/10.1117/1.1793156


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