0
Articles

Double-sided micromachining process for silicon cantilever using a parallel capacitively coupled plasma

[+] Author Affiliations
Wei-Chih Wang, Joe Nhut Ho, Per G. Reinhall

University of Washington, Department of Mechanical Engineering, Seattle, Washington 98195-2600 E-mail: abong@u.washington.edu

J. Micro/Nanolith. MEMS MOEMS. 4(1), 013010 (Feb. 1, 2005). doi:10.1117/1.1856928
History: Received Feb. 6, 2003; Revised Jul. 2, 2004; Accepted Jul. 21, 2004; Feb. 1, 2005; Online February 01, 2005
Text Size: A A A

A double-sided micromachining process for silicon-based device fabrication is developed that allows the use of capacitively coupled reactive ion etching (RIE) equipment for high-aspect-ratio etching. The effects of the masking materials and RIE conditions are discussed. Based on the experimental results, a 1000-Å-thick Al film sufficiently protects the unexposed substrate while allowing the etching of a 350-μm-deep hole with an area of 3×3 mm2 when etching with SF6/CHF3/O2 plasma. A 2000-μm-long and 100-μm-wide (with layers of Al/SiO2/Si and thickness of 0.1/2.2/40 μm, respectively) cantilever beam is achieved. A silicon etch rate up to 2.5 to 2.8 μm/min is obtained and an anisotropy of A=0.5(A=1V/H, where V is the horizontal undercut and H is the etch depth) is obtained. The technique is developed mainly for bulk micromachining of silicon or composite silicon cantilever structures. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Wei-Chih Wang ; Joe Nhut Ho and Per G. Reinhall
"Double-sided micromachining process for silicon cantilever using a parallel capacitively coupled plasma", J. Micro/Nanolith. MEMS MOEMS. 4(1), 013010 (Feb. 1, 2005). ; http://dx.doi.org/10.1117/1.1856928


Access This Article
Sign In to Access Full Content
Please Wait... Processing your request... Please Wait.
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
 
Your Session has timed out. Please sign back in to continue.
Sign In to Access Full Content

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement


Buy this article ($18 for members, $25 for non-members).
Sign In