Articles

Influence of shadow mask design and deposition methods on nonplanar dielectric material deposition

[+] Author Affiliations
Sarah B. Blickenstaff

Air Force Research Laboratory, Sensors Directorate, 2241 Avionics Circle, Wright-Patterson Air Force Base, Ohio 45433-7322 E-mail: Sarah.Blickenstaff@wpafb.af.mil

Andrew M. Sarangan

University of Dayton, Electro-optics Engineering, 300 College Park, Dayton, Ohio 45469

Thomas R. Nelson, Kevin D. Leedy, Donald L. Agresta

Air Force Research Laboratory, Sensors Directorate, 2241 Avionics Circle, Wright-Patterson Air Force Base, Ohio 45433-7322

J. Micro/Nanolith. MEMS MOEMS. 4(2), 023015 (Apr. 22, 2005). doi:10.1117/1.1897381
History: Received May 25, 2004; Revised Aug. 23, 2004; Accepted Sep. 30, 2004; Apr. 22, 2005; Online April 22, 2005
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In this paper, we report on the deposition of nonplanar SiO2 and SiNx dielectric layers using plasma-enhanced chemical vapor deposition (PECVD), radio frequency (rf) sputtering and reactive rf sputtering through metal and dielectric shadow masks. The layers were analyzed for trends in deposition rate and curvature as a function of shadow mask material and geometry, as well as the deposition method. Increasing the top hole diameter, which is the limiting aperture of the shadow mask cavity, increased the rate of deposition inside the cavity, but it also decreased the curvature of the resulting aspheric microlens. As the height of the shadow mask cavity was increased, both the cavity deposition rate and microlens curvature increased. An alumina shadow mask created microlenses with higher deposition rates and more curvature than a nickel shadow mask for the three deposition methods. SiO2 deposited by PECVD produced aspheric microlenses with the most curvature, whereas rf sputtering SiO2 produced microlenses with the highest process efficiency. These results could be exploited to produce single or multilayer dielectric films for use in focal-plane arrays of microlenses, light-emitting diode encapsulations or curved Bragg mirrors for vertical-cavity surface-emitting lasers. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Sarah B. Blickenstaff ; Andrew M. Sarangan ; Thomas R. Nelson, Jr. ; Kevin D. Leedy and Donald L. Agresta
"Influence of shadow mask design and deposition methods on nonplanar dielectric material deposition", J. Micro/Nanolith. MEMS MOEMS. 4(2), 023015 (Apr. 22, 2005). ; http://dx.doi.org/10.1117/1.1897381


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