Enhanced poly gate critical dimension control by using a SiOxNy ARC film

Christopher Bencher; Tony Chu; Way Tat Tan; Gang Zou; Qunying Lin; Xu Yi; Wang Xu Dong; Ma Wei Wen

doi:10.1117/12.280548

14 August 1997 Enhanced poly gate critical dimension control by using a SiOxNy ARC film

Christopher Bencher, Tony Chu, Way Tat Tan, Gang Zou, Qunying Lin, Xu Yi, Wang Xu Dong, Ma Wei Wen

Proceedings Volume 3183, Microlithographic Techniques in IC Fabrication; (1997) https://doi.org/10.1117/12.280548
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore

Abstract

In this study, a silicon oxy-nitride (SiOxNy) film deposited using the plasma enhanced chemical vapor deposition method has been developed and applied to improve poly-gate level resist line CD control. The desired optical properties of a SiOxNy anti-reflective coating (ARC) film and its optimum thickness were targeted by using a photolithography simulator. A process matrix study has led to the identification of an optimized SiOxNy film Dielectric ARC deposition process for i-line photolithography applications. Using the optimized SiOxNy film as the ARC, significant improvements, compared to the standard and top ARC techniques, have been achieved, including 5 times reduction in does to clear swing ratio and complete elimination of reflection induced photoresist notching and necking effects. Moreover, a 2500 wafer marathon run demonstrated that the refractive index, extinction coefficient and thickness of this film can be controlled to +/- 0.04, +/- 0.03 and +/- 12A, respectively and that the particle performance is excellent.

Citation Download Citation

Christopher Bencher, Tony Chu, Way Tat Tan, Gang Zou, Qunying Lin, Xu Yi, Wang Xu Dong, and Ma Wei Wen "Enhanced poly gate critical dimension control by using a SiOxNy ARC film", Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); https://doi.org/10.1117/12.280548

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available