Special Section on Nanopatterning

Study of pattern placement error by thermal expansions in nanoimprint lithography

[+] Author Affiliations
Yifang Chen

Rutherford Appleton Laboratory, Chilton, Didcot, Oxon OX11 0QX, United Kingdom

Jiarui Tao

Rutherford Appleton Laboratory, Chilton, Didcot, Oxon OX11 0QX, United Kingdom and Wuhan University, Department of Physics, Wuhan 430072, China

Xingzhong Zhao

Wuhan University, Department of Physics, Wuhan 430072, China

Zheng Cui

Rutherford Appleton Laboratory, Chilton, Didcot, Oxon OX11 0QX, United Kingdom

J. Micro/Nanolith. MEMS MOEMS. 5(1), 011002 (March 10, 2006). doi:10.1117/1.2172991
History: Received January 01, 2005; Revised March 01, 2005; Accepted June 01, 2005; Published March 10, 2006
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Pattern placement error (or pattern distortion) caused by different thermal expansions between templates and substrates in nanoimprint lithography is experimentally investigated. Using fabricated nanorulers, placement errors are quantitatively measured. Our results prove that nanoimprint lithography (NIL) with a heat cycle does have considerable error of pattern placement. But that is not the case with imprints at room temperature. This indicates that low-temperature or room-temperature imprints should be effective solutions.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Yifang Chen ; Jiarui Tao ; Xingzhong Zhao and Zheng Cui
"Study of pattern placement error by thermal expansions in nanoimprint lithography", J. Micro/Nanolith. MEMS MOEMS. 5(1), 011002 (March 10, 2006). ; http://dx.doi.org/10.1117/1.2172991


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