Special Section on Nanopatterning

Sustained polymer membranes fabricated by nanoimprint lithography

[+] Author Affiliations
Helmut Schift

Paul Scherrer Institut, Laboratory for Micro- and Nanotechnology, 5232 Villigen PSI, Switzerland

Sandro Bellini

University of Applied Sciences Nordwestschweiz, Institute of Nanotechnological Applications in Polymers, 5210 Windisch, Switzerland

Uwe Pieles

University of Applied Sciences Nordwestschweiz, Department of Chemistry and Nanotechnology, 4132 Muttenz, Switzerland

Jens Gobrecht

Paul Scherrer Institut, Laboratory for Micro- and Nanotechnology, 5232 Villigen PSI, Switzerland and University of Applied Sciences Nordwestschweiz, Institute of Nanotechnological Applications in Polymers, 5210 Windisch, Switzerland

J. Micro/Nanolith. MEMS MOEMS. 5(1), 011010 (February 13, 2006). doi:10.1117/1.2172993
History: Received March 01, 2005; Revised May 01, 2005; Accepted August 01, 2005; Published February 13, 2006
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Perforated polymer membranes are fabricated using nanoimprint lithography and a sacrificial layer technique. The membranes with micrometer-sized pores are partially released from the substrate by locally dissolving the underlying layer. Thus, large arrays with interconnected pores can be fabricated. This process can be applied to a wide selection of polymeric materials, and has the potential to be extended to submicrostructures.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Helmut Schift ; Sandro Bellini ; Uwe Pieles and Jens Gobrecht
"Sustained polymer membranes fabricated by nanoimprint lithography", J. Micro/Nanolith. MEMS MOEMS. 5(1), 011010 (February 13, 2006). ; http://dx.doi.org/10.1117/1.2172993


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