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Two-dimensional periodic potential via multiple-beam interferometry for atom lithography

[+] Author Affiliations
Kamlesh Alti

Indian Institute of Technology Guwahati, Department of Physics, Guwahati, India

A. S. Patra

Indian Institute of Technology Guwahati, Department of Physics, Guwahati, India

Alika Khare

Indian Institute of Technology Guwahati, Department of Physics, Guwahati, India

J. Micro/Nanolith. MEMS MOEMS. 5(2), 023005 (May 12, 2006). doi:10.1117/1.2201017
History: Received April 28, 2005; Revised August 09, 2005; Accepted November 14, 2005; Published May 12, 2006
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We propose the use of square arrays of multiple atomic lenses, produced by interference of four nearly collinear optical beams in atom lithography using dipole force. Simulated lithographic patterns are reported for collimated as well as divergent rubidium atomic beam traveling in such square arrays of optical channels. The proposed configuration has the ability to write large numbers of periodic structures in square arrays in a single step.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Kamlesh Alti ; A. S. Patra and Alika Khare
"Two-dimensional periodic potential via multiple-beam interferometry for atom lithography", J. Micro/Nanolith. MEMS MOEMS. 5(2), 023005 (May 12, 2006). ; http://dx.doi.org/10.1117/1.2201017


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