Special Section on Extreme-Ultraviolet Lithography

Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond

[+] Author Affiliations
Marc Bienert

Carl Zeiss SMT AG, 73446 Oberkochen, Germany

Aksel Göhnemeier

Carl Zeiss SMT AG, 73446 Oberkochen, Germany

Oliver Natt

Carl Zeiss SMT AG, 73446 Oberkochen, Germany

Martin Lowisch

Carl Zeiss SMT AG, 73446 Oberkochen, Germany

Paul Gräupner

Carl Zeiss SMT AG, 73446 Oberkochen, Germany

Tilmann Heil

Carl Zeiss SMT AG, 73446 Oberkochen, Germany

Reiner Garreis

Carl Zeiss SMT AG, 73446 Oberkochen, Germany

Koen van Ingen Schenau

ASML, De Run 6501, Veldhoven, Netherlands

Steve Hansen

TDC, ASML US, 8555 South River Parkway, Tempe, Arizona

J. Micro/Nanolith. MEMS MOEMS. 8(4), 041509 (October 05, 2009). doi:10.1117/1.3238543
History: Received March 06, 2009; Revised June 09, 2009; Accepted August 06, 2009; Published October 05, 2009
Text Size: A A A

We derive an imaging budget from the performance of extreme ultraviolet (EUV) optics with NA = 0.32, and demonstrate that the requirements for 22-nm applications are met. Based on aerial image simulations, we analyze the impact of all relevant contributors, ranging from conventional quantities like straylight or aberrations, to EUV-specific topics, namely the influence of 3-D mask effects and faceted illumination pupils. As test structures we consider dense to isolated lines, contact holes, and 2-D elbows. We classify the contributions in a hierarchical order according to their weight in the critical dimension uniformity (CDU) budget and identify the main drivers. The underlying physical mechanisms causing different contributions to be critical or less significant are clarified. Finally, we give an outlook for the 16- and 11-nm nodes. Future developments in optics manufacturing will keep the budgets controlled, thereby paving the way to enable printing of these upcoming nodes.

Figures in this Article
© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Marc Bienert ; Aksel Göhnemeier ; Oliver Natt ; Martin Lowisch ; Paul Gräupner, et al.
"Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond", J. Micro/Nanolith. MEMS MOEMS. 8(4), 041509 (October 05, 2009). ; http://dx.doi.org/10.1117/1.3238543


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.