Articles

Wafer-scale process for fabricating arrays of nanopore devices

[+] Author Affiliations
Amir G. Ahmadi

Georgia Institute of Technology, School of Chemical and Biomolecular Engineering, 311 Ferst Drive, Atlanta, Georgia 30332-0100

Zhengchun Peng

Georgia Institute of Technology, Woodruff School of Mechanical Engineering, 801 Ferst Drive, Atlanta, Georgia 30332-0405

Peter J. Hesketh

Georgia Institute of Technology, Woodruff School of Mechanical Engineering, 801 Ferst Drive, Atlanta, Georgia 30332-0405

Sankar Nair

Georgia Institute of Technology, School of Chemical and Biomolecular Engineering, 311 Ferst Drive, Atlanta, Georgia 30332-0100

J. Micro/Nanolith. MEMS MOEMS. 9(3), 033011 (September 07, 2010). doi:10.1117/1.3486202
History: Received February 10, 2010; Revised July 20, 2010; Accepted July 26, 2010; Published September 07, 2010; Online September 07, 2010
Text Size: A A A

Nanopore-based single-molecule analysis is a subject of strong scientific and technological interest. Recently, solid state nanopores have been demonstrated to possess advantages over biological (e.g., protein) pores due to the relative ease of tuning the pore dimensions, pore geometry, and surface chemistry. Previously demonstrated methods have been confined to the production of single nanopore devices for fundamental studies. Most of these techniques (e.g., electron microscope beams and focused ion beams) are limited in scalability, automation, and reproducibility. We demostrate a wafer-scale method for reproducibly fabricating large arrays of solid state nanopores. The method couples high-resolution electron-beam lithography and atomic layer deposition (ALD). Arrays of nanopores (825 per wafer) are successfully fabricated across 4-in. wafers with tunable pore sizes. The nanopores are fabricated in 16-to50-nm thin silicon nitride. ALD of aluminum oxide is used to tune the nanopore size. By careful optimization of the processing steps, a device survival rate of up to 96% is achieved on a wafer with 50-nm thin silicon nitride films. Our results facilitate an important step in the development of large-scale nanopore arrays for practical applications such as biosensing.

Figures in this Article
© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Amir G. Ahmadi ; Zhengchun Peng ; Peter J. Hesketh and Sankar Nair
"Wafer-scale process for fabricating arrays of nanopore devices", J. Micro/Nanolith. MEMS MOEMS. 9(3), 033011 (September 07, 2010). ; http://dx.doi.org/10.1117/1.3486202


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.