Articles

Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography

[+] Author Affiliations
Jalal Rouhi, Shahrom Mahmud

Universiti Sains Malaysia, Nano-Optoelectronic Research (NOR) Lab, School of Physics, Pulau Pinang, 11800 Malaysia

Sabar Derita Hutagalung

Universiti Sains Malaysia, School of Materials and Mineral Resources Engineering, Nibong Tebal, Pinang, 14300 Malaysia

Saeid Kakooei

Universiti Teknologi Petronas, Department of Mechanical Engineering, Perak, 31750 Malaysia

J. Micro/Nanolith. MEMS MOEMS. 10(4), 043002 (October 04, 2011). doi:10.1117/1.3643480
History: Received May 07, 2011; Revised July 28, 2011; Accepted September 02, 2011; Published October 04, 2011; Online October 04, 2011
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In this study, a simple technique was introduced for the fabrication of nanogap electrodes by using nano-oxidation scanning probe microscopy lithography with a Cr/Pt coated silicon tip. Silicon electrodes with a gap of sub-31 nm were fabricated successfully by this technique. The current-voltage measurements (I-V) of the electrodes demonstrated excellent insulating characteristics. This technique is simple, controllable, inexpensive, and faster than common methods. The results showed that silicon electrodes have a great potential for the fabrication of single molecule transistors, single electron transistors, and other nanoelectronic devices.

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© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Jalal Rouhi ; Shahrom Mahmud ; Sabar Derita Hutagalung and Saeid Kakooei
"Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography", J. Micro/Nanolith. MEMS MOEMS. 10(4), 043002 (October 04, 2011). ; http://dx.doi.org/10.1117/1.3643480


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