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Combining micro- and nano-texture to fabricate an antireflective layer

[+] Author Affiliations
Mohammad Malekmohammad, Mohammad Soltanolkotabi, Mohammad H. Naderi

University of Isfahan, Department of Physics, Hezar Jerib, 81746–73441, Isfahan, Iran

Reza Asadi

University of Tehran, Department of Physics, Kargar, Tehran, Iran

Alireza Erfanian, M. Zahedinejad, Mahdi Khaje

K.N. Toosi University of Technology, Department of Electrical Engineering, Seyyed Khandan Bridge, Tehran, Iran

Shahin Bagheri

Shahid Beheshti University, Laser and Plasma Research Institute, G.C. Evin, Tehran, Iran

J. Micro/Nanolith. MEMS MOEMS. 11(1), 013011 (Mar 21, 2012). doi:10.1117/1.JMM.11.1.013011
History: Received November 3, 2011; Revised December 28, 2011; Accepted February 1, 2012
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Abstract.  We combined photonic crystal (PC) and nanoporous structures in silicon (Si) to decrease the reflectance of the Si surface. Due to gradual increase of effective refractive index in this structure, reflection is reduced drastically over a broad spectral range. A two-dimensional Si PC was fabricated by interference lithography, then a nanoporous structure was made on the PC by using metal-assisted chemical etching. The obtained reflectance is about 3% across a spectral range of 400 to 2000 nm. This indicates an improvement of reflectance up to 90% compared to bare Si.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Mohammad Malekmohammad ; Mohammad Soltanolkotabi ; Reza Asadi ; Mohammad H. Naderi ; Alireza Erfanian, et al.
"Combining micro- and nano-texture to fabricate an antireflective layer", J. Micro/Nanolith. MEMS MOEMS. 11(1), 013011 (Mar 21, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.1.013011


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