Special Section on EUV Sources for Lithography

New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes

[+] Author Affiliations
Konstantin Koshelev

Institute for Spectroscopy RAS, Fizicheskaya Str., 5, Troitsk, Moscow 142190, Russia

Vladimir Krivtsun, Vladimir Ivanov, Oleg Yakushev, Alexey Chekmarev, Vsevolod Koloshnikov, Evegenii Snegirev, Viacheslav Medvedev

Institute for Spectroscopy RAS, Fizicheskaya Str., 5, Troitsk, Moscow 142190, Russia

J. Micro/Nanolith. MEMS MOEMS. 11(2), 021103 (May 16, 2012). doi:10.1117/1.JMM.11.2.021103
History: Received August 1, 2011; Revised November 21, 2011; Accepted December 28, 2011
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Abstract.  A new approach for discharge-produced plasma (DPP) extreme ultraviolet (EUV) sources based on the usage of two liquid metallic alloy jets as discharge electrodes has been proposed and tested. Discharge was ignited using laser ablation of one of the cathode jets. A system with two jet electrodes was tested at a repetition rate of 1 to 5 kHz with dissipated electrical power up to 20 kW. Radiating spectra, time characteristics, and conversion efficiency are similar to conventional DPP schemes with rotating wheels. In the first experiments, the Ga:Sn eutectic alloy, which is liquid at room temperature, was circulating in a closed loop. The high velocity of the jets (30m/s) ensures a renewed electrode surface for every shot, for a repetition rate frequency of up to 30 to 50 kHz, and provides effective heat transportation from the discharge zone. Modeling and experiments demonstrate that the proposed scheme is able to dissipate up to 200 kW of electrical power without overheating the nozzles and tin surface. It was found that the flexible electrode configuration allows the channeling of essential parts of debris plasma in directions opposite to the EUV collector.

Figures in this Article
© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Konstantin Koshelev ; Vladimir Krivtsun ; Vladimir Ivanov ; Oleg Yakushev ; Alexey Chekmarev, et al.
"New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes", J. Micro/Nanolith. MEMS MOEMS. 11(2), 021103 (May 16, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.021103


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