Regular Articles

Phase defect mitigation strategy: unveiling fiducial mark requirements on extreme ultraviolet lithography masks

[+] Author Affiliations
Tetsunori Murachi, Tsuyoshi Amano, Sung Hyun Oh

EUVL Infrastructure Development Center Inc., 16-1 Onogawa, Tsukuba-shi, Ibaraki-ken 305-8569, Japan

J. Micro/Nanolith. MEMS MOEMS. 12(2), 023008 (May 31, 2013). doi:10.1117/1.JMM.12.2.023008
History: Received January 11, 2013; Revised March 29, 2013; Accepted May 1, 2013
Text Size: A A A

Abstract.  For extreme ultraviolet lithography (EUVL), the fabrication of defect free multi-layered (ML) mask blanks is a challenge. ML defects are generated by substrate defects and adders during ML coating and are called phase defects (PDs). If we can accept ML blanks with a certain number of PDs, the blank yield will be drastically increased. We can use fewer PD blanks and reduce PD influence by covering them with an absorber layer. To do this, PDs should be located during ML blank defect inspection before absorber patterning. To locate PDs on blanks accurately and precisely, the fiducial marks (FMs) on ML blanks can be used for mask alignment. The defect location accuracy requirement is below 10 nm. We present the results of a feasibility study on the requirements of FMs on EUVL masking by simulations and experiments to establish a PD mitigation method with the EUV actinic blank inspection tool. Based on the results, the optimum ranges for FM lines etched into the ML are 3 to 5 μm in width and at least 100 nm in depth.

© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Tetsunori Murachi ; Tsuyoshi Amano and Sung Hyun Oh
"Phase defect mitigation strategy: unveiling fiducial mark requirements on extreme ultraviolet lithography masks", J. Micro/Nanolith. MEMS MOEMS. 12(2), 023008 (May 31, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.2.023008


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.