Special Section on Alternative Lithographic Technologies

Three-dimensional x-ray metrology for block copolymer lithography line-space patterns

[+] Author Affiliations
Daniel F. Sunday

National Institute of Standards and Technology, Materials Science and Engineering Division, Gaithersburg, Maryland 20899

Matthew R. Hammond

National Institute of Standards and Technology, Materials Science and Engineering Division, Gaithersburg, Maryland 20899

Chengqing Wang

National Institute of Standards and Technology, Materials Science and Engineering Division, Gaithersburg, Maryland 20899

Wen-li Wu

National Institute of Standards and Technology, Materials Science and Engineering Division, Gaithersburg, Maryland 20899

R. Joseph Kline

National Institute of Standards and Technology, Materials Science and Engineering Division, Gaithersburg, Maryland 20899

Gila E. Stein

University of Houston, Department of Chemical and Biomolecular Engineering, Houston, Texas 77004

J. Micro/Nanolith. MEMS MOEMS. 12(3), 031103 (Aug 12, 2013). doi:10.1117/1.JMM.12.3.031103
History: Received April 18, 2013; Revised May 22, 2013; Accepted June 13, 2013
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Abstract.  We report on the development of a new measurement method, resonant critical-dimension small-angle x-ray scattering (res-CDSAXS), for the characterization of the buried structure of block copolymers (BCP) used in directed self assembly (DSA). We use resonant scattering at the carbon edge to enhance the contrast between the two polymer blocks and allow the determination of the three-dimensional shape of the native lamella in a line–space pattern by CDSAXS. We demonstrate the method by comparing the results from conventional CDSAXS to res-CDSAXS on a 1:1 DSA BCP sample with a nominal 50-nm pitch. The res-CDSAXS method provides substantially improved uncertainty in the fit of the line shape and allows the determination of the buried structure.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Daniel F. Sunday ; Matthew R. Hammond ; Chengqing Wang ; Wen-li Wu ; R. Joseph Kline, et al.
"Three-dimensional x-ray metrology for block copolymer lithography line-space patterns", J. Micro/Nanolith. MEMS MOEMS. 12(3), 031103 (Aug 12, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.3.031103


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