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Line edge and width roughness smoothing by plasma treatment

[+] Author Affiliations
Peter De Schepper

Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

Katholieke Universiteit Leuven (KULeuven), Department of Chemistry, 3001 Leuven, Belgium

Terje Hansen

Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

Katholieke Universiteit Leuven (KULeuven), Department of Chemistry, 3001 Leuven, Belgium

Efrain Altamirano-Sanchez

Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

Alessandro Vaglio Pret

Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

KLA-Tencor, Process Control Information Division, Research Park Haasrode 1112, Esperantolaan 8, 3001 Leuven, Belgium

Ziad el Otell

Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

Katholieke Universiteit Leuven (KULeuven), Department of Chemistry, 3001 Leuven, Belgium

Werner Boulart

Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

Stefan De Gendt

Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

Katholieke Universiteit Leuven (KULeuven), Department of Chemistry, 3001 Leuven, Belgium

J. Micro/Nanolith. MEMS MOEMS. 13(2), 023006 (May 19, 2014). doi:10.1117/1.JMM.13.2.023006
History: Received December 18, 2013; Revised March 31, 2014; Accepted April 16, 2014
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Abstract.  Smoothing effects of postlithography plasma treatments on 22-nm lines and spaces are evaluated for two types of extreme ultraviolet photoresists, using five different plasma processes (Ar, H2/Ar, HBr, H2/N2, and H2). Experimental results indicate a reduction in linewidth roughness of about 10% by using an H2 plasma smoothing process. This smoothing process is mainly triggered by the synergy of vacuum ultraviolet photons and H2 reactive species during the plasma treatment. Moreover, the smoothing process is dependent on the resist composition and the pattern dimensions. This paper shows the impact of different plasma conditions on roughness reduction for 22-nm lines.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Peter De Schepper ; Terje Hansen ; Efrain Altamirano-Sanchez ; Alessandro Vaglio Pret ; Ziad el Otell, et al.
"Line edge and width roughness smoothing by plasma treatment", J. Micro/Nanolith. MEMS MOEMS. 13(2), 023006 (May 19, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.2.023006


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