Artificially controlled plasmonic nanostructures at the subwavelength scale are smaller than the available wavelength of illumination. The preparation of such subwavelength plasmonic nanostructures usually involves the use of expensive high-performance equipment for semiconductor mass production. Conventionally, direct-writing electron beam lithography or focused ion-beam techniques are adopted for the fabrication of the nanoscale structures. These techniques are necessary to produce plasmonic resonance in visible regions. However, these methods are slow and expensive, limiting their practical application for the fabrication of large-area surfaces. Given these considerations, nanoimprint lithography (NIL) is considered to be an ideal solution for large-area patterning of nanoscale structures at relatively low cost.9,10 The NIL technique is based on the direct physical and mechanical deformation of the resist, making it suitable to obtain significantly high resolution, unlike conventional photolithography techniques associated with the light diffraction or scattering. Because of its high resolution, feasibility for mass fabrication, reproducibility, and good uniformity over large surface areas, NIL can be regarded as the most effective nanofabrication technique. Thus far, some studies have demonstrated the fabrication of emission-enhanced substrates using NIL. Nevertheless, most studies have mainly focused on the imprint polymer-based PL properties of dielectric substrates.11,12 Moreover, previous studies on PlCs-based emissions did not demonstrate a significant enhancement because their surrounding dielectric layer of emitters is limited by the effective coupling between the emitters and the excited plasmonic resonances.13,14 A uniform spectral response of plasmonic resonances without local spot dependence has not been sufficiently demonstrated,15,16 although higher uniformity of plasmonic resonance on large-area surfaces would enable more quantitative sensing on the substrates.