Special Section on Photomask Manufacturing Technology

Development of nanoimprint lithography templates toward high-volume manufacturing

[+] Author Affiliations
Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, Naoya Hayashi

Dai Nippon Printing Co., Ltd., 2-2-1, Fukuoka, Fujimino-shi, Saitama 356-8507, Japan

J. Micro/Nanolith. MEMS MOEMS. 15(2), 021006 (Feb 05, 2016). doi:10.1117/1.JMM.15.2.021006
History: Received October 31, 2015; Accepted January 14, 2016
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Abstract.  Development of nanoimprint lithography (NIL) templates is discussed. The template fabrication process and its performance are presented with consideration of the requirements of NIL for high-volume manufacturing. Defectivity, image placement, and critical dimension uniformity are the three major performance parameters of the templates, and their current status is shown.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Koji Ichimura ; Kouji Yoshida ; Saburo Harada ; Takaharu Nagai ; Masaaki Kurihara, et al.
"Development of nanoimprint lithography templates toward high-volume manufacturing", J. Micro/Nanolith. MEMS MOEMS. 15(2), 021006 (Feb 05, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.021006


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